Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A2 | P23975 | 2/20 | 0.39 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.39 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.39 |
| ▸ | OPRM1 | P35372 | 8/20 | 0.35 |
| ▸ | OPRL1 | P41146 | 8/20 | 0.34 |
| ▸ | CCR2 | P41597 | 4/20 | 0.34 |
| ▸ | OPRD1 | P41143 | 3/20 | 0.34 |
| ▸ | SCN1A | P35498 | 1/20 | 0.33 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.33 |
| ▸ | SCN3A | Q9NY46 | 1/20 | 0.33 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.32 |
| ▸ | KDR | P35968 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26426933 | 0.91 | SLC6A2 (0.39) | SLC6A2SLC6A4SLC6A3OPRM1OPRL1 | |
| SCHEMBL26426896 | 0.85 | MMP2 (0.34) | — | |
| SCHEMBL26426900 | 0.83 | DRD2 (0.40) | — | |
| SCHEMBL26426903 | 0.82 | — | — | |
| SCHEMBL26426893 | 0.81 | DRD2 (0.32) | — | |
| SCHEMBL26426902 | 0.79 | — | — | |
| SCHEMBL26426881 | 0.79 | OPRM1 (0.37) | OPRM1 | |
| SCHEMBL26426897 | 0.79 | USP2 (0.35) | SLC6A4SLC6A3OPRM1OPRL1 | |
| SCHEMBL23870964 | 0.77 | SLC6A2 (0.45) | SLC6A2SLC6A4SLC6A3OPRM1OPRL1 | |
| SCHEMBL23870810 | 0.76 | SLC6A2 (0.44) | SLC6A2SLC6A4SLC6A3OPRM1OPRL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11835859-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| US-20230129578-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20230129578-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |