SCHEMBL26426933

SCHEMBL26426933

O=C(OC1(c2ccc(Cl)c(C(F)(F)F)c2)CCNCC1)c1cc(I)cc(I)c1O

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ SLC6A2 P23975 1/20 0.39
▸ SLC6A4 P31645 1/20 0.39
▸ SLC6A3 Q01959 1/20 0.39
▸ OPRM1 P35372 6/20 0.35
▸ OPRL1 P41146 6/20 0.34
▸ CCR2 P41597 4/20 0.34
▸ OPRD1 P41143 2/20 0.34
▸ SCN1A P35498 1/20 0.32
▸ SCN2A Q99250 1/20 0.32
▸ SCN3A Q9NY46 1/20 0.32
▸ OPRK1 P41145 1/20 0.32
▸ KDR P35968 1/20 0.31
▸ MEN1 O00255 1/20 0.31
▸ HSPD1 P10809 1/20 0.31
▸ PNLIP P16233 1/20 0.31
▸ PIK3CA P42336 1/20 0.31
▸ HTT P42858 1/20 0.31
▸ BLM P54132 1/20 0.31
▸ HSPE1 P61604 1/20 0.31
▸ KMT2A Q03164 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26426904 0.91 SLC6A2 (0.39) SLC6A2SLC6A4SLC6A3OPRM1OPRL1
SCHEMBL26426926 0.85 MMP2 (0.34) —
SCHEMBL26426928 0.84 MEN1 (0.39) SLC6A3MEN1HSPD1PNLIPPIK3CA
SCHEMBL26426932 0.82 TTR (0.31) MEN1HSPD1PNLIPPIK3CAHTT
SCHEMBL26426925 0.81 DPP4 (0.33) —
SCHEMBL26426931 0.79 — —
SCHEMBL26426913 0.79 OPRM1 (0.36) OPRM1
SCHEMBL26426927 0.79 USP2 (0.34) OPRM1OPRL1
SCHEMBL23870964 0.77 SLC6A2 (0.45) SLC6A2SLC6A4SLC6A3OPRM1OPRL1
SCHEMBL23870810 0.76 SLC6A2 (0.44) SLC6A2SLC6A4SLC6A3OPRM1OPRL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 — — US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 — — US disclosed
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