SCHEMBL26445970

SCHEMBL26445970

O=C(NS(=O)(=O)C(F)(F)C(F)(F)C(F)F)c1ccc(OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)S(=O)(=O)O)cc1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALOX15 P16050 1/20 0.35
GFER P55789 1/20 0.35
ADAM17 P78536 1/20 0.35
CXCR2 P25025 1/20 0.34
TRPV1 Q8NER1 1/20 0.34
MAPT P10636 3/20 0.33
USP2 O75604 1/20 0.33
TSHR P16473 1/20 0.33
ENPP3 O14638 2/20 0.33
ENPP1 P22413 2/20 0.33
ENPP2 Q13822 1/20 0.33
MEN1 O00255 1/20 0.32
GAA P10253 1/20 0.32
MAPK1 P28482 1/20 0.32
HTT P42858 1/20 0.32
KMT2A Q03164 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
PTPN1 P18031 1/20 0.31
BCL2L1 Q07817 2/20 0.30
MCL1 Q07820 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23808361 0.90 ENPP1 (0.36) ALOX15GFERADAM17CXCR2TRPV1
SCHEMBL25467937 0.85 STS (0.35) CXCR2MAPTENPP3ENPP1ENPP2
SCHEMBL25467901 0.85 CXCR2 (0.34) CXCR2TRPV1MAPTENPP3ENPP1
SCHEMBL29319689 0.84 CXCR2 (0.34) CXCR2TRPV1MAPTENPP3ENPP1
SCHEMBL26452260 0.84 CXCR2 (0.34) ALOX15GFERADAM17CXCR2MAPT
SCHEMBL26445899 0.83 CXCR2 (0.38) CXCR2MAPTENPP3ENPP1ENPP2
SCHEMBL25881636 0.83 SMN1; SMN2 (0.33) CXCR2MAPTENPP3ENPP1ENPP2
SCHEMBL24909132 0.81 PTPN1 (0.33) CXCR2MAPTENPP3ENPP1ENPP2
SCHEMBL25468209 0.78 CXCR2 (0.36) CXCR2TRPV1MAPTENPP3ENPP1
SCHEMBL26452047 0.78 CXCR2 (0.36) ALOX15GFERADAM17CXCR2TRPV1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230139891-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND FUJIFILM CORPORATION (JP) 2023-05-04 US disclosed