SCHEMBL25468209

SCHEMBL25468209

CC(C)(C(C)(C)S(=O)(=O)O)C(C)(C)S(=O)(=O)Oc1ccc(C(=O)NS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)S(=O)(=O)O)cc1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CXCR2 P25025 2/20 0.36
MEN1 O00255 3/20 0.33
KMT2A Q03164 3/20 0.33
SMN1; SMN2 Q16637 3/20 0.33
MAPT P10636 2/20 0.33
MAPK1 P28482 2/20 0.33
GAA P10253 1/20 0.33
HTT P42858 1/20 0.33
EGFR P00533 1/20 0.33
ENPP1 P22413 4/20 0.32
ENPP3 O14638 3/20 0.32
ENPP2 Q13822 1/20 0.32
PTPN1 P18031 1/20 0.32
TRPV1 Q8NER1 2/20 0.32
STS P08842 1/20 0.32
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
LMNA P02545 1/20 0.31
NPC1 O15118 1/20 0.31
ALDH1A1 P00352 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23808361 0.87 ENPP1 (0.36) CXCR2MEN1KMT2ASMN1; SMN2MAPT
SCHEMBL25467901 0.86 CXCR2 (0.34) CXCR2MEN1KMT2ASMN1; SMN2MAPT
SCHEMBL29319689 0.83 CXCR2 (0.34) CXCR2MEN1KMT2ASMN1; SMN2MAPT
SCHEMBL26445899 0.82 CXCR2 (0.38) CXCR2MEN1KMT2ASMN1; SMN2MAPT
SCHEMBL25467937 0.81 STS (0.35) CXCR2MEN1KMT2ASMN1; SMN2MAPT
SCHEMBL26452260 0.81 CXCR2 (0.34) CXCR2MEN1KMT2ASMN1; SMN2MAPT
SCHEMBL25881636 0.80 SMN1; SMN2 (0.33) CXCR2MEN1KMT2ASMN1; SMN2MAPT
SCHEMBL26445970 0.78 ALOX15 (0.35) CXCR2MEN1KMT2ASMN1; SMN2MAPT
SCHEMBL24909132 0.78 PTPN1 (0.33) CXCR2MEN1KMT2ASMN1; SMN2MAPT
SCHEMBL25139371 0.76 GFER (0.36) MEN1KMT2ASMN1; SMN2MAPTMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230148344-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, COMPOUND, AND METHOD FOR PRODUCING COMPOUND FUJIFILM CORPORATION (JP) 2023-05-11 US disclosed
US-20230148344-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, COMPOUND, AND METHOD FOR PRODUCING COMPOUND FUJIFILM CORPORATION (JP) 2023-05-11 US disclosed