Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | PTPN1 | P18031 | 4/20 | 0.38 |
| ▸ | PTPN2 | P17706 | 2/20 | 0.38 |
| ▸ | PTPN6 | P29350 | 2/20 | 0.38 |
| ▸ | SLC22A6 | Q4U2R8 | 2/20 | 0.37 |
| ▸ | SLC22A8 | Q8TCC7 | 2/20 | 0.37 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.37 |
| ▸ | CSNK2A1 | P68400 | 1/20 | 0.36 |
| ▸ | NOTUM | Q6P988 | 1/20 | 0.35 |
| ▸ | GPR35 | Q9HC97 | 1/20 | 0.35 |
| ▸ | HNF4A | P41235 | 1/20 | 0.35 |
| ▸ | TP53 | P04637 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | HPGD | P15428 | 1/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.34 |
| ▸ | HMGB1 | P09429 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27078215 | 0.80 | PTPN1 (0.39) | PTPN1PTPN2PTPN6MCL1HNF4A | |
| SCHEMBL17402635 | 0.78 | MCL1 (0.44) | KDM4ETDP1PTPN1PTPN2PTPN6 | |
| Styrene SCHEMBL27834603 | 0.76 | ALDH1A1 (0.52) | KDM4ETDP1MEN1KMT2ATP53 | |
| SCHEMBL220169 | 0.74 | MCL1 (0.51) | TDP1MEN1KMT2APTPN1PTPN2 | |
| SCHEMBL3392534 | 0.74 | KDM4E (0.58) | KDM4ETDP1MEN1KMT2AMCL1 | |
| SCHEMBL940632 | 0.74 | MCL1 (0.48) | TDP1PTPN1PTPN2PTPN6MCL1 | |
| SCHEMBL31454779 | 0.72 | PKM (0.50) | KDM4ETDP1MEN1KMT2APTPN1 | |
| SCHEMBL2024208 | 0.72 | GLRA3 (0.49) | TDP1MEN1KMT2APTPN1PTPN2 | |
| SCHEMBL28005667 | 0.72 | SLC22A8 (0.47) | KDM4ETDP1MEN1KMT2ASLC22A6 | |
| SCHEMBL12339911 | 0.72 | MCL1 (0.47) | KDM4EPTPN1PTPN2PTPN6MCL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114195643-B | Compound, polymer, patterning material, patterning method, and method for manufacturing semiconductor device | 铠侠股份有限公司 | 2024-05-24 | — | — | CN | disclosed |
| US-20240004298-A1 | COMPOUND, POLYMER, PATTERN FORMING MATERIAL, PATTERN FORMING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | KIOXIA CORPORATION (JP) | 2024-01-04 | — | — | US | disclosed |
| US-11796915-B2 | Compound, polymer, pattern forming material, pattern forming method, and method of manufacturing semiconductor device | KIOXIA CORPORATION (JP) | 2023-10-24 | — | — | US | disclosed |
| US-11796915-B2 | Compound, polymer, pattern forming material, pattern forming method, and method of manufacturing semiconductor device | KIOXIA CORPORATION (JP) | 2023-10-24 | — | — | US | disclosed |
| US-11796915-B2 | Compound, polymer, pattern forming material, pattern forming method, and method of manufacturing semiconductor device | KIOXIA CORPORATION (JP) | 2023-10-24 | — | — | US | disclosed |
| CN-114195643-A | Compound, polymer, pattern forming material, pattern forming method, and method for manufacturing semiconductor device | 铠侠股份有限公司 | 2022-03-18 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240004298-A1 | COMPOUND, POLYMER, PATTERN FORMING MATERIAL, PATTERN FORMING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | H1-4, H1-3, C5 | KDM4E 1665/4885TDP1 4824/4885MEN1 368/4885 |
| US-11796915-B2 | Compound, polymer, pattern forming material, pattern forming method, and method of manufacturing semiconductor device | H1-4, H1-3, C5 | KDM4E 1665/4885TDP1 4824/4885MEN1 368/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.