SCHEMBL26705151

SCHEMBL26705151

CC1(C)CC(C2CCCCC(C)(C)O2)CCCN1

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALPL P05186 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15129694 0.73 ALDH1A1 (0.32)
SCHEMBL10989392 0.72 ALDH1A1 (0.30)
SCHEMBL18125569 0.72 L3MBTL1 (0.33)
SCHEMBL10989560 0.70 L3MBTL1 (0.32)
SCHEMBL25810635 0.69 L3MBTL1 (0.31)
SCHEMBL21662880 0.69
SCHEMBL28011806 0.68 ALDH1A1 (0.36) ALPL
SCHEMBL21884333 0.60 ALPL (0.41) ALPL
SCHEMBL10991238 0.59 L3MBTL1 (0.33)
SCHEMBL4437707 0.58 ALPL (0.39) ALPL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230350294-A1 Negative Photosensitive Resin Composition, Patterning Process, Interlayer Insulating Film, Surface Protection Film, And Electronic Component SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-02 US disclosed