SCHEMBL268416

SCHEMBL268416

C=CC(=O)Oc1ccc(S(=O)(=O)c2ccc(OC(=O)C=C)cc2)cc1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PKM P14618 3/20 0.60
MAPT P10636 2/20 0.60
POLB P06746 2/20 0.60
ELANE P08246 2/20 0.55
THRB P10828 2/20 0.51
ALDH1A1 P00352 3/20 0.47
GAA P10253 2/20 0.44
HTT P42858 2/20 0.42
SMN1; SMN2 Q16637 2/20 0.42
MAPK1 P28482 2/20 0.42
NPC1 O15118 1/20 0.42
LMNA P02545 1/20 0.42
TP53 P04637 1/20 0.42
TSHR P16473 1/20 0.42
XBP1 P17861 1/20 0.42
RAB9A P51151 1/20 0.42
MDM2 Q00987 1/20 0.42
HSD17B10 Q99714 1/20 0.42
NPSR1 Q6W5P4 1/20 0.41
APEX1 P27695 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5360324 0.93 ELANE (0.61) PKMMAPTPOLBELANETHRB
SCHEMBL689560 0.86 TDP1 (0.52) PKMMAPTPOLBELANETHRB
SCHEMBL2587522 0.85 THRB (0.64) PKMMAPTELANETHRBALDH1A1
SCHEMBL14596348 0.85 THRB (0.53) PKMMAPTPOLBELANETHRB
SCHEMBL1373940 0.85 THRB (0.49) PKMMAPTPOLBELANETHRB
SCHEMBL964748 0.85 CA2 (0.54) THRBALDH1A1HTTCA12CA1
SCHEMBL11346616 0.85 TDP1 (0.50) PKMMAPTPOLBELANETHRB
SCHEMBL11205293 0.85 THRB (0.49) PKMMAPTPOLBELANETHRB
SCHEMBL13777854 0.84 MAPT (0.45) PKMMAPTPOLBELANETHRB
SCHEMBL7212835 0.84 THRB (0.80) PKMMAPTPOLBELANETHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-62263086-A None JP disclosed
US-8980374-B2 Method for producing functional film FUJIFILM CORPORATION (JP) 2015-03-17 US disclosed
US-8322869-B2 Optical film, polarizing plate, and image display apparatus FUJIFILM CORPORATION (JP) 2012-12-04 US disclosed
US-8322869-B2 Optical film, polarizing plate, and image display apparatus FUJIFILM CORPORATION (JP) 2012-12-04 US disclosed
US-8313201-B2 Optical film, polarizing plate and image display apparatus FUJIFILM CORPORATION (JP) 2012-11-20 US disclosed
US-8313201-B2 Optical film, polarizing plate and image display apparatus FUJIFILM CORPORATION (JP) 2012-11-20 US disclosed
US-20120208038-A1 HARDCOAT LAMINATE KONDO SHUNICHI (JP) 2012-08-16 US disclosed
US-20120208038-A1 HARDCOAT LAMINATE KONDO SHUNICHI (JP) 2012-08-16 US disclosed
US-8236912-B2 Gas-barrier film and environment-sensitive device FUJIFILM CORPORATION (JP) 2012-08-07 US disclosed
US-8197946-B2 Barrier laminate, barrier film substrate, methods for producing them, and device FUJIFILM CORPORATION (JP) 2012-06-12 US disclosed
US-20090130472-A1 HARDCOAT LAMINATE FUJIFILM CORPORATION (JP) 2009-05-21 US disclosed
US-20090130472-A1 HARDCOAT LAMINATE FUJIFILM CORPORATION (JP) 2009-05-21 US disclosed
US-20090095345-A1 GAS-BARRIER FILM AND ENVIRONMENT-SENSITIVE DEVICE FUJIFILM CORPORATION (JP) 2009-04-16 US disclosed
US-20090091835-A1 OPTICAL FILM, POLARIZING PLATE, AND IMAGE DISPLAY APPARATUS FUJIFILM CORPORATION (JP) 2009-04-09 US disclosed
US-20090091835-A1 OPTICAL FILM, POLARIZING PLATE, AND IMAGE DISPLAY APPARATUS FUJIFILM CORPORATION (JP) 2009-04-09 US disclosed
US-20090075098-A1 ENVIRONMENT-SENSITIVE DEVICE, AND METHOD FOR SEALING ENVIRONMENT- SENSITIVE ELEMENT FUJIFILM CORPORATION (JP) 2009-03-19 US disclosed
US-20090029183-A1 BARRIER FILM SUBSTRATE AND METHOD FOR PRODUCING SAME, AND ORGANIC DEVICE FUJIFILM CORPORATION (JP) 2009-01-29 US disclosed
US-20080305350-A1 BARRIER LAMINATE, BARRIER FILM SUBSTRATE, METHODS FOR PRODUCING THEM, AND DEVICE FUJIFILM CORPORATION (JP) 2008-12-11 US disclosed
JP-S62263086-A THERMAL RECORDING PAPER NIPPON SHOKUBAI KAGAKU KOGYO CO LTD 1987-11-16 JP disclosed
US-4374854-A Fungicidal sulfur-containing phenyl esters and mixtures thereof GAF CORPORATION (US) 1983-02-22 US disclosed