SCHEMBL5360324

SCHEMBL5360324

C=CC(=O)Oc1ccc(S(=O)(=O)c2ccc(O)cc2)cc1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 2/20 0.61
PKM P14618 3/20 0.56
GAA P10253 2/20 0.56
MAPT P10636 2/20 0.53
POLB P06746 1/20 0.53
THRB P10828 2/20 0.46
ALDH1A1 P00352 2/20 0.42
ALDH5A1 P51649 1/20 0.40
ABAT P80404 1/20 0.40
LMNA P02545 2/20 0.39
CA2 P00918 3/20 0.38
CA12 O43570 1/20 0.38
CA1 P00915 1/20 0.38
CA9 Q16790 1/20 0.38
ENPP2 Q13822 1/20 0.38
NPC1 O15118 1/20 0.38
TP53 P04637 1/20 0.38
TSHR P16473 1/20 0.38
XBP1 P17861 1/20 0.38
MAPK1 P28482 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL268416 0.93 PKM (0.60) ELANEPKMGAAMAPTPOLB
SCHEMBL140760 0.87 THRB (0.56) ELANEGAAMAPTTHRBALDH5A1
Methoxymethane SCHEMBL9576531 0.82 THRB (0.56) ELANEPKMGAAMAPTTHRB
SCHEMBL824857 0.82 THRB (0.51) ELANEGAAMAPTTHRBALDH5A1
SCHEMBL24472724 0.80 ELANE (0.45) ELANEPKMGAAMAPTPOLB
SCHEMBL10721385 0.80 ELANE (0.67) ELANEPKMGAAMAPTPOLB
SCHEMBL7050331 0.80 ELANE (0.62) ELANEPKMGAAMAPTPOLB
SCHEMBL689560 0.80 TDP1 (0.52) ELANEPKMMAPTPOLBTHRB
SCHEMBL2587522 0.79 THRB (0.64) ELANEPKMMAPTTHRBALDH1A1
SCHEMBL14227007 0.79 PKM (0.85) ELANEPKMGAAMAPTPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220169060-A1 THERMOSENSITIVE RECORDING MEDIUM AND IMAGE-FORMING METHOD CANON KABUSHIKI KAISHA (JP) 2022-06-02 US disclosed
CN-100346230-C Material for preservative formation TOKYO O KAGAKU KOGYO CO LTD (JP) 2007-10-31 CN disclosed
US-7179399-B2 Material for forming protective film TOKYO OHKA KOGYO CO., LTD. (JP) 2007-02-20 US disclosed
US-6689535-B2 A NOVALAK RESIN CROSSLINKING AGENT HAVING HYDROXYALKYL AND/OR ALKOXYALKYL GROUPS AND AN ACIDIC COMPOUND; UNDERCOATINGS; A RECTANGULAR CROSS-SECTIONAL PROFILE WITHOUT CAUSING FOOTING, UNDERCUTTING, ETC. AT THE BOTTOM TOKYO OHKA KOGYO CO., LTD (JP) 2004-02-10 US disclosed
CN-1388414-A Material for preservative formation TOKYO O KAGAKU KOGYO CO LTD (JP) 2003-01-01 CN disclosed
US-20020182360-A1 Material for forming protective film TOKYO OHKA KOGYO CO., LTD. (JP) 2002-12-05 US disclosed
US-20020055064-A1 Anti-reflective coating composition, multilayer photoresist material using the same, and method for forming pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2002-05-09 US disclosed
US-6083665-A Photoresist laminate and method for patterning using the same TOKYO OHKA KOGYO CO., LTD. (JP) 2000-07-04 US disclosed
US-5925495-A Photoresist laminate and method for patterning using the same TOKYO OHKA KOGYO CO., LTD. (JP) 1999-07-20 US disclosed