SCHEMBL2689280

SCHEMBL2689280

COc1ccc(C(C)(C)c2ccccc2)cc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA4 P22748 1/20 0.56
ALDH1A1 P00352 3/20 0.56
ESR1 P03372 1/20 0.56
CYP3A4 P08684 1/20 0.56
ESR2 Q92731 1/20 0.56
SMN1; SMN2 Q16637 2/20 0.55
LTA4H P09960 2/20 0.54
KIF11 P52732 5/20 0.53
KCNH2 Q12809 1/20 0.53
MEN1 O00255 4/20 0.50
KMT2A Q03164 4/20 0.50
CA12 O43570 1/20 0.50
CA1 P00915 1/20 0.50
CA2 P00918 1/20 0.50
CA7 P43166 1/20 0.50
CA9 Q16790 1/20 0.50
CA14 Q9ULX7 1/20 0.50
TRPA1 O75762 1/20 0.48
KDM4E B2RXH2 3/20 0.46
POLB P06746 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29024093 0.94 LTA4H (0.65) CA4ALDH1A1ESR1CYP3A4ESR2
SCHEMBL10112753 0.91 CA1 (0.61) CA4ALDH1A1ESR1CYP3A4ESR2
SCHEMBL25986528 0.91 CA1 (0.61) CA4ALDH1A1ESR1CYP3A4ESR2
SCHEMBL83852 0.91 CA1 (0.61) CA4ALDH1A1ESR1CYP3A4ESR2
SCHEMBL12868821 0.90 LTA4H (0.72) CA4ALDH1A1ESR1CYP3A4ESR2
SCHEMBL22015331 0.89 SMN1; SMN2 (0.46) CA4ALDH1A1ESR1CYP3A4ESR2
SCHEMBL10112754 0.87 ESR1 (0.59) CA4ALDH1A1ESR1CYP3A4ESR2
SCHEMBL4570566 0.86 CA4 (0.56) CA4ESR1ESR2LTA4HKIF11
SCHEMBL25048 0.86 CA4 (0.56) CA4ESR1ESR2LTA4HKIF11
SCHEMBL12220669 0.86 ALDH1A1 (0.49) ALDH1A1ESR1CYP3A4ESR2SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 83 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240210827-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS ASAHI KASEI KABUSHIKI KAISHA (JP) 2024-06-27 US disclosed
US-11674045-B2 Three-dimensional printing ink comprising a phthalonitrile oligomer LG CHEM, LTD (KR) 2023-06-13 US disclosed
WO-2022243222-A1 FLAME-RETARDANT COMPOSITION CONTAINING 0.040 TO 0.095 WT.% OF A FLAME RETARDANT COVESTRO DEUTSCHLAND AG (DE) 2022-11-24 WO disclosed
US-11312860-B2 Polycarbonate-based resin composition and molded article thereof IDEMITSU KOSAN CO., LTD. (JP) 2022-04-26 US disclosed
US-11186714-B2 Polycarbonate resin composition and molded product thereof IDEMITSU KOSAN CO., LTD. (JP) 2021-11-30 US disclosed
US-11175559-B2 Electrochromic device RICOH COMPANY, LTD. (JP) 2021-11-16 US disclosed
US-20210179776-A1 POLYCARBONATE-BASED RESIN COMPOSITION AND MOLDED PRODUCT THEREOF IDEMITSU KOSAN CO., LTD. (JP) 2021-06-17 US disclosed
US-10996105-B2 Optical filter having low incident angle dependence of incident light, ambient light sensor, sensor module and electronic device JSR CORPORATION (JP) 2021-05-04 US disclosed
US-20200278243-A1 OPTICAL FILTER, AMBIENT LIGHT SENSOR, SENSOR MODULE AND ELECTRONIC DEVICE JSR CORPORATION (JP) 2020-09-03 US disclosed
US-20190310530-A1 ELECTROCHROMIC DEVICE RICOH COMPANY, LTD. (JP) 2019-10-10 US disclosed
US-20080081124-A1 INK JET INK COMPOSITION, AND IMAGE FORMATION METHOD AND RECORDED MATERIAL EMPLOYING SAME FUJIFILM CORPORATION (JP) 2008-04-03 US disclosed
US-20070249736-A1 Titanium-Containing Silica Sol and Process for Producing the Same, Antifouling Film and Base Material with Ink-Receptive Layer, and Method for Reproducing Recording Base Material CATALYSTS & CHEMICALS INDUSTRIES CO., LTD. (JP) 2007-10-25 US disclosed
EP-1806375-A1 Process for obtaining aqueous compositions comprising curing epoxy agents Cognis IP Management GmbH (DE) 2007-07-11 EP disclosed
EP-1251371-B1 LIGHT GUIDE PLATES AND PROCESS FOR PRODUCING THE SAME IDEMITSU KOSAN CO (JP) 2007-02-21 EP disclosed
US-20070031358-A1 Cosmetic formulations comprising diketo diphenyl pyrrolo-pyrrole pigments CIBA SPECIALTY CHEMICALS CORP. 2007-02-08 US disclosed
US-20070031358-A1 Cosmetic formulations comprising diketo diphenyl pyrrolo-pyrrole pigments CIBA SPECIALTY CHEMICALS CORP. 2007-02-08 US disclosed
US-20070004823-A1 Ink composition, image forming method and printed article FUJI PHOTO FILM CO., LTD. 2007-01-04 US disclosed
EP-0057740-A1 Pressure sensitive recording sheets DIAMOND SHAMROCK CORPORATION (US) 1982-08-18 EP disclosed
US-4275906-A Pressure sensitive recording sheets DIAMOND SHAMROCK CORPORATION (US) 1981-06-30 US disclosed
US-4101323-A Radiation-sensitive copying composition HOECHST AKTIENGESELLSCHAFT (DE) 1978-07-18 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070031358-A1 Cosmetic formulations comprising diketo diphenyl pyrrolo-pyrrole pigments TYR, LAGE3, KRT18 CA4 3408/4885ALDH1A1 1910/4885ESR1 4561/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.