SCHEMBL2689936

SCHEMBL2689936

NC(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)F

nearest known ligand 0.34

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.34
KDM4E B2RXH2 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
USP2 O75604 1/20 0.32
MAPT P10636 1/20 0.32
CYP1A2 P05177 1/20 0.30
CYP2C9 P11712 1/20 0.30
CYP2C19 P33261 1/20 0.30
RECQL P46063 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3025513 1.00 TSHR (0.34) TSHRKDM4ETDP1USP2MAPT
SCHEMBL3873381 1.00 TSHR (0.34) TSHRKDM4ETDP1USP2MAPT
SCHEMBL10879855 1.00 TSHR (0.34) TSHRKDM4ETDP1USP2MAPT
SCHEMBL14797831 0.97 KDM4E (0.36) TSHRKDM4ETDP1
SCHEMBL2986166 0.91 KDM4E (0.41) TSHRKDM4ETDP1
SCHEMBL5487202 0.84 TSHR (0.42) TSHRKDM4ETDP1USP2MAPT
SCHEMBL1824498 0.84 TSHR (0.42) TSHRKDM4ETDP1USP2MAPT
SCHEMBL1824897 0.84 TSHR (0.42) TSHRKDM4ETDP1USP2MAPT
SCHEMBL1827978 0.84 TSHR (0.42) TSHRKDM4ETDP1USP2MAPT
SCHEMBL5492824 0.84 TSHR (0.42) TSHRKDM4ETDP1USP2MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8936744-B2 Photocurable resin composition containing fluorine and method for producing a resin mold using same DONGJIN SEMICHEM CO., LTD. (KR) 2015-01-20 US claimed
US-20120114906-A1 PHOTOCURABLE RESIN COMPOSITION CONTAINING FLUORINE AND METHOD FOR PRODUCING A RESIN MOLD USING SAME DONGJIN SEMICHEM CO., LTD (KR) 2012-05-10 US claimed
US-20250297145-A1 SURFACE TOLERANT ADHESIVE HUNTSMAN ADVANCED MATERIALS AMERICAS LLC 2025-09-25 US disclosed
EP-4486841-A2 SURFACE TOLERANT ADHESIVE Huntsman Advanced Materials Americas LLC (US) 2025-01-08 EP disclosed
WO-2023183119-A9 SURFACE TOLERANT ADHESIVE HUNTSMAN ADVANCED MATERIALS AMERICAS LLC (US) 2023-11-16 WO disclosed
WO-2023183119-A2 SURFACE TOLERANT ADHESIVE HUNTSMAN ADVANCED MATERIALS AMERICAS LLC (US) 2023-09-28 WO disclosed
EP-4183837-A1 CHARGEABILITY IMPARTING AGENT, CHARGEABLE RESIN COMPOSITION AND CHARGED NONWOVEN FABRIC Sanyo Chemical Industries, Ltd. (JP) 2023-05-24 EP disclosed
EP-3650481-A1 RESIN, RESIN COMPOSITION, NONWOVEN FABRIC USING SAME, FIBER PRODUCT, SEPARATOR, SECONDARY BATTERY, AND METHOD FOR PRODUCING ELECTRIC DOUBLE LAYER CAPACITOR AND NONWOVEN FABRIC Toray Industries, Inc. (JP) 2020-05-13 EP disclosed
US-20200131366-A1 RESIN, RESIN COMPOSITION, NONWOVEN FABRIC USING SAME, FIBER PRODUCT, SEPARATOR, SECONDARY BATTERY AND ELECTRIC DOUBLE LAYER CAPACITOR, AND METHOD FOR PRODUCING NONWOVEN FABRIC TORAY INDUSTRIES, INC. (JP) 2020-04-30 US disclosed
EP-2463073-B1 RESIN MOLD FOR IMPRINTING AND METHOD FOR PRODUCING SAME SOKEN KAGAKU KK (JP) 2018-04-04 EP disclosed
US-9511535-B2 Resin mold, production method thereof, and use thereof SOKEN CHEMICAL & ENGINEERING CO., LTD. (JP) 2016-12-06 US disclosed
US-7626034-B2 Asymmetric reductive amination of keto acid derivatives for producing amino acid derivatives TAKASAGO INTERNATIONAL CORPORATION (JP) 2009-12-01 US disclosed
EP-2100875-A1 Asymmetric reductive amination of keto acid derivatives for producing amino acid derivatives Takasago International Corporation (JP) 2009-09-16 EP disclosed
US-7351849-B2 Process for producing optically active β-amino acid derivatives TAKASAGO INTERNATIONAL CORPORATION (JP) 2008-04-01 US disclosed
US-20070142443-A1 Asymmetric reductive amination of keto acid derivatives for producing amino acid derivatives TAKASAGO INTERNATIONAL CORPORATION (JP) 2007-06-21 US disclosed
US-20060205968-A1 Process for producing optically active beta-amino acid derivatives TAKASAGO INTERNATIONAL CORPORATION (JP) 2006-09-14 US disclosed
EP-1685092-A2 ASYMMETRIC REDUCTIVE AMINATION OF KETO ACID DERIVATIVES FOR PRODUCING AMINO ACID DERIVATIVES Takasago International Corporation (JP) 2006-08-02 EP disclosed
EP-1656342-A2 PROCESS FOR PRODUCING OPTICALLY ACTIVE BETA-AMINO ACID DERIVATIVES Takasago International Corporation (JP) 2006-05-17 EP disclosed
WO-2005028419-A2 ASYMMETRIC REDUCTIVE AMINATION OF KETO ACID DERIVATIVES FOR PRODUCING AMINO ACID DERIVATIVES TAKASAGO INTERNATIONAL CORPORATION (JP) 2005-03-31 WO disclosed
WO-2005016866-A2 PROCESS FOR PRODUCING OPTICALLY ACTIIVE BETA-AMINO ACID DERIVATIVES TAKASAGO INTERNATIONAL CORPORATION (JP) 2005-02-24 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20060205968-A1 Process for producing optically active beta-amino acid derivatives BCAT1, ALAD, AADAT TSHR 4691/4885KDM4E 4273/4885TDP1 4754/4885
US-20070142443-A1 Asymmetric reductive amination of keto acid derivatives for producing amino acid derivatives AADAT, BCAT2, BCAT1 TSHR 1734/4885KDM4E 549/4885TDP1 4621/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.