Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 3/20 | 0.39 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | HPGD | P15428 | 3/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.33 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.32 |
| ▸ | SIRT5 | Q9NXA8 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26939177 | 0.92 | EPHX2 (0.34) | EPHX2SLC6A3L3MBTL1 | |
| SCHEMBL120796 | 0.84 | EPHX2 (0.40) | EPHX2SLC6A3POLBHPGDL3MBTL1 | |
| SCHEMBL23365338 | 0.82 | EPHX2 (0.40) | EPHX2SLC6A3POLBHPGDL3MBTL1 | |
| SCHEMBL16281976 | 0.82 | EPHX2 (0.39) | EPHX2SLC6A3POLBHPGDL3MBTL1 | |
| SCHEMBL13527836 | 0.81 | EPHX2 (0.35) | EPHX2SLC6A3POLBCYP19A1ALDH1A1 | |
| SCHEMBL3674828 | 0.79 | SLC6A3 (0.34) | EPHX2SLC6A3POLBL3MBTL1CYP19A1 | |
| SCHEMBL13588105 | 0.78 | EPHX2 (0.34) | EPHX2CYP19A1ALDH1A1 | |
| SCHEMBL16684205 | 0.78 | SLC6A3 (0.33) | EPHX2SLC6A3POLBL3MBTL1CYP19A1 | |
| SCHEMBL4900373 | 0.78 | SLC6A3 (0.33) | EPHX2SLC6A3POLBL3MBTL1 | |
| SCHEMBL12812192 | 0.77 | ALDH1A1 (0.34) | EPHX2SLC6A3HPGDSMN1; SMN2CYP19A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230400766-A1 | ONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-14 | — | — | US | disclosed |
| US-20230400766-A1 | ONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-14 | — | — | US | disclosed |