Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SIGMAR1 | Q99720 | 6/20 | 0.48 |
| ▸ | TAAR1 | Q96RJ0 | 4/20 | 0.48 |
| ▸ | SLC6A2 | P23975 | 3/20 | 0.48 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.48 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.48 |
| ▸ | MAOA | P21397 | 1/20 | 0.48 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.48 |
| ▸ | ADORA2A | P29274 | 1/20 | 0.48 |
| ▸ | ADORA1 | P30542 | 1/20 | 0.48 |
| ▸ | TRPA1 | O75762 | 2/20 | 0.46 |
| ▸ | SLC18A2 | Q05940 | 1/20 | 0.45 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.45 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.41 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.41 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.41 |
| ▸ | HTR2A | P28223 | 1/20 | 0.41 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.41 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.41 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bicarbonate SCHEMBL28004213 | 0.93 | NPC1 (0.47) | SIGMAR1TRPA1 | |
| SCHEMBL23554980 | 0.86 | TRPA1 (0.52) | SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3 | |
| SCHEMBL16287104 | 0.85 | SIGMAR1 (0.46) | SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3 | |
| SCHEMBL14118700 | 0.83 | SIGMAR1 (0.48) | SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3 | |
| SCHEMBL2700588 | 0.83 | SIGMAR1 (0.52) | SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3 | |
| SCHEMBL1839615 | 0.82 | SLC6A2 (0.50) | SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3 | |
| SCHEMBL19725380 | 0.82 | TRPA1 (0.50) | SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3 | |
| SCHEMBL19762341 | 0.82 | TRPA1 (0.50) | SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3 | |
| Bicarbonate SCHEMBL28004686 | 0.82 | CTSK (0.49) | — | |
| SCHEMBL8155375 | 0.82 | SIGMAR1 (0.52) | SIGMAR1MAOA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8673538-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition | FUJIFILM CORPORATION (JP) | 2014-03-18 | — | — | US | disclosed |
| US-8673538-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition | FUJIFILM CORPORATION (JP) | 2014-03-18 | — | — | US | disclosed |
| EP-2447773-B1 | Method for producing a pattern, method for producing a MEMS structure, use of a cured film of a photosensitive composition as a sacrificial layer or as a component of a MEMS structure | FUJIFILM CORP (JP) | 2013-07-10 | — | — | EP | disclosed |
| US-20130029255-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2013-01-31 | — | — | US | disclosed |
| US-20130029255-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2013-01-31 | — | — | US | disclosed |
| US-20120107563-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERN, MEMS STRUCTURE, METHOD FOR PRODUCING THE STRUCTURE, METHOD FOR DRY ETCHING, METHOD FOR WET ETCHING, MEMS SHUTTER DEVICE, AND IMAGE DISPLAY APPARATUS | FUJIFILM CORPORATION (JP) | 2012-05-03 | — | — | US | disclosed |
| EP-2447773-A1 | Photosensitive resin composition, method for producing pattern, MEMS structure, method for producing the structure, method for dry etching, method for wet etching, MEMS shutter device, and image display apparatus | Fujifilm Corporation (JP) | 2012-05-02 | — | — | EP | disclosed |