Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 3/20 | 0.70 |
| ▸ | MAPT | P10636 | 2/20 | 0.70 |
| ▸ | CYP19A1 | P11511 | 14/20 | 0.62 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.62 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17775770 | 0.85 | LMNA (0.77) | LMNAMAPTCYP19A1CYP3A4 | |
| SCHEMBL27046922 | 0.84 | LMNA (0.75) | LMNAMAPTCYP19A1CYP3A4HSD17B10 | |
| Methandrostenolone SCHEMBL28423591 | 0.82 | LMNA (1.00) | LMNAMAPTCYP19A1CYP3A4HSD17B10 | |
| Methandrostenolone SCHEMBL21177905 | 0.82 | LMNA (1.00) | LMNAMAPTCYP19A1CYP3A4HSD17B10 | |
| Methandrostenolone SCHEMBL16755284 | 0.82 | LMNA (1.00) | LMNAMAPTCYP19A1CYP3A4HSD17B10 | |
| Methandrostenolone SCHEMBL8408550 | 0.82 | LMNA (1.00) | LMNAMAPTCYP19A1CYP3A4HSD17B10 | |
| Methandrostenolone SCHEMBL4435272 | 0.82 | LMNA (1.00) | LMNAMAPTCYP19A1CYP3A4HSD17B10 | |
| SCHEMBL5270893 | 0.82 | LMNA (0.81) | LMNAMAPTCYP19A1CYP3A4HSD17B10 | |
| SCHEMBL10861103 | 0.82 | LMNA (0.81) | LMNAMAPTCYP19A1CYP3A4HSD17B10 | |
| Methandrostenolone SCHEMBL140928 | 0.82 | LMNA (1.00) | LMNAMAPTCYP19A1CYP3A4HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |