SCHEMBL27053038

SCHEMBL27053038

Cc1cc(OC(F)(F)F)c(O)c(C(=O)O)c1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ AKR1C2 P52895 2/20 0.43
▸ AKR1C1 Q04828 2/20 0.43
▸ CSNK2A1 P68400 1/20 0.41
▸ KDM4E B2RXH2 2/20 0.40
▸ THRB P10828 1/20 0.39
▸ HMGB1 P09429 1/20 0.38
▸ CXCL12 P48061 1/20 0.38
▸ NOTUM Q6P988 1/20 0.37
▸ CASP3 P42574 1/20 0.36
▸ CASP7 P55210 1/20 0.36
▸ CASP9 P55211 1/20 0.36
▸ HPGD P15428 2/20 0.36
▸ HSD17B10 Q99714 2/20 0.36
▸ FABP4 P15090 1/20 0.36
▸ FABP5 Q01469 1/20 0.36
▸ USP2 O75604 1/20 0.36
▸ ALDH1A1 P00352 1/20 0.36
▸ CYP2C19 P33261 1/20 0.36
▸ PTGS1 P23219 1/20 0.35
▸ PTGS2 P35354 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6119514 0.82 MYC (0.39) AKR1C2AKR1C1CSNK2A1KDM4ENOTUM
SCHEMBL14363157 0.79 PKM (0.55) CSNK2A1KDM4EHPGDALDH1A1PTGS1
SCHEMBL23858450 0.78 ALDH1A1 (0.46) AKR1C2AKR1C1CSNK2A1KDM4EHPGD
SCHEMBL1505292 0.78 CSNK2A1 (0.50) CSNK2A1KDM4ENOTUMHPGDHSD17B10
SCHEMBL27051511 0.77 GLRA3 (0.42) AKR1C2AKR1C1DHODHKMO
SCHEMBL5029492 0.75 CSNK2A1 (0.58) AKR1C2AKR1C1CSNK2A1KDM4ETHRB
SCHEMBL25564616 0.74 CSNK2A1 (0.44) AKR1C2AKR1C1CSNK2A1KDM4EHMGB1
SCHEMBL1970631 0.72 ALB (0.52) AKR1C2AKR1C1KDM4EHMGB1HPGD
SCHEMBL3946987 0.72 CFD (0.50) AKR1C2AKR1C1
SCHEMBL122472 0.70 HMGB1 (0.62) AKR1C2AKR1C1CSNK2A1KDM4EHMGB1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240027903-A1 Resist Material And Patterning Process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20240027903-A1 Resist Material And Patterning Process LBR, HNRNPU, EWSR1 AKR1C2 4198/4885AKR1C1 4387/4885CSNK2A1 1393/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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