SCHEMBL2707905

SCHEMBL2707905

O=C(O)c1ccc(Oc2ccccc2C2(c3ccccc3Oc3ccc(C(=O)O)cc3)c3cc(C45CC6CC(CC(C6)C4)C5)ccc3-c3ccc(C45CC6CC(CC(C6)C4)C5)cc32)cc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HIF1A Q16665 4/20 0.42
EPAS1 Q99814 3/20 0.42
RARB P10826 6/20 0.40
RARG P13631 6/20 0.40
RARA P10276 5/20 0.40
MEN1 O00255 4/20 0.40
KMT2A Q03164 4/20 0.40
NR1I2 O75469 1/20 0.40
LMNA P02545 1/20 0.40
PGR P06401 1/20 0.40
HSPD1 P10809 1/20 0.40
GOT1 P17174 1/20 0.40
GLRA1 P23415 1/20 0.40
BLM P54132 1/20 0.40
HSPE1 P61604 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
THRB P10828 1/20 0.40
RECQL P46063 1/20 0.40
NR2E1 Q9Y466 1/20 0.40
RXRA P19793 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2707994 0.88 HIF1A (0.42) HIF1AEPAS1MEN1KMT2AKDM4E
SCHEMBL2707835 0.87 HIF1A (0.45) HIF1AEPAS1RARBRARGRARA
SCHEMBL2710248 0.86 RXRA (0.43) RARBRARGRARARXRACYP3A4
Hydrochloric Acid SCHEMBL3187412 0.86 HIF1A (0.44) HIF1AEPAS1RARBRARGRARA
Hydrochloric Acid SCHEMBL3187397 0.86 HIF1A (0.44) HIF1AEPAS1RARBRARGRARA
SCHEMBL2706767 0.85 ALDH1A1 (0.47) HIF1AEPAS1MEN1KMT2ALMNA
SCHEMBL2710161 0.82 RARB (0.48) HIF1AEPAS1RARBRARGRARA
SCHEMBL2710722 0.81 HIF1A (0.47) HIF1AEPAS1RARBRARGRARA
SCHEMBL2710476 0.81 MEN1 (0.39) HIF1AEPAS1MEN1KMT2ALMNA
SCHEMBL2707912 0.81 RARA (0.38) HIF1AEPAS1RARBRARGRARA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2000510-B1 RESIN COMPOSITION, VARNISH, RESIN FILM, AND SEMICONDUCTOR DEVICE USING THE RESIN FILM SUMITOMO BAKELITE CO (JP) 2012-05-02 EP disclosed
US-7863347-B2 Resin composition, varnish, resin film and semiconductor device using the same SUMITOMO BAKELITE COMPANY, LTD. (JP) 2011-01-04 US disclosed
US-7652125-B2 Resin composition, polyimide resin composition, polybenzoxazole resin composition, varnish, resin film and semiconductor device using the same SUMITOMO BAKELITE COMPANY, LTD. (JP) 2010-01-26 US disclosed
US-20090118431-A1 RESIN COMPOSITION, VARNISH, RESIN FILM AND SEMICONDUCTOR DEVICE USING THE SAME SUMITOMO BAKELITE COMPANY, LTD (JP) 2009-05-07 US disclosed
EP-2000510-A1 RESIN COMPOSITION, VARNISH, RESIN FILM, AND SEMICONDUCTOR DEVICE USING THE RESIN FILM Sumitomo Bakelite Company, Ltd. (JP) 2008-12-10 EP disclosed
US-20080255335-A1 Resin Composition, Polyimide Resin Composition, Polybenzoxazole Resin Composition, Varnish, Resin Film and Semiconductor Device Using the Same SUMITOMO BAKELITE COMPANY LTD. (JP) 2008-10-16 US disclosed
EP-1813637-A1 RESIN COMPOSITION, POLYIMIDE RESIN COMPOSITION, POLY- BENZOXAZOLE RESIN COMPOSITION, VARNISHES, RESIN FILMS AND SEMICONDUCTOR DEVICES MADE BY USING THE SAME Sumitomo Bakelite Company, Limited (JP) 2007-08-01 EP disclosed