SCHEMBL2707997

SCHEMBL2707997

O=C(O)c1ccc(Oc2ccc(C3(c4ccc(Oc5ccc(C(=O)O)c(C(=O)O)c5)cc4)c4cc(C56CC7CC(CC(C7)C5)C6)ccc4-c4ccc(C56CC7CC(CC(C7)C5)C6)cc43)cc2)cc1C(=O)O

nearest known ligand 0.41

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
POLB P06746 3/20 0.41
HIF1A Q16665 5/20 0.41
EPAS1 Q99814 3/20 0.41
SERPINE1 P05121 2/20 0.40
MEN1 O00255 3/20 0.39
KMT2A Q03164 3/20 0.39
RAB9A P51151 1/20 0.39
GAA P10253 1/20 0.37
GFER P55789 1/20 0.37
LMNA P02545 2/20 0.36
ALDH1A1 P00352 2/20 0.36
L3MBTL1 Q9Y468 2/20 0.36
HPSE Q9Y251 1/20 0.35
TDP1 Q9NUW8 2/20 0.35
EPHX2 P34913 2/20 0.35
APEX1 P27695 1/20 0.34
CTDSP1 Q9GZU7 1/20 0.34
NPC1 O15118 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2707835 0.87 HIF1A (0.45) POLBHIF1AEPAS1SERPINE1MEN1
SCHEMBL2708378 0.87 SERPINE1 (0.45) POLBHIF1AEPAS1SERPINE1MEN1
SCHEMBL2707994 0.86 HIF1A (0.42) POLBHIF1AEPAS1SERPINE1MEN1
Hydrochloric Acid SCHEMBL3187412 0.86 HIF1A (0.44) POLBHIF1AEPAS1SERPINE1MEN1
Hydrochloric Acid SCHEMBL3187397 0.86 HIF1A (0.44) POLBHIF1AEPAS1SERPINE1MEN1
SCHEMBL2708799 0.81 HIF1A (0.43) POLBHIF1AEPAS1SERPINE1MEN1
SCHEMBL2706843 0.81 HIF1A (0.42) POLBHIF1AEPAS1SERPINE1MEN1
SCHEMBL2708786 0.80 POLB (0.48) POLBHIF1AEPAS1SERPINE1MEN1
SCHEMBL2706770 0.80 ALDH1A1 (0.54) POLBHIF1AEPAS1MEN1KMT2A
SCHEMBL2710478 0.80 MEN1 (0.42) POLBHIF1AEPAS1SERPINE1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2000510-B1 RESIN COMPOSITION, VARNISH, RESIN FILM, AND SEMICONDUCTOR DEVICE USING THE RESIN FILM SUMITOMO BAKELITE CO (JP) 2012-05-02 EP disclosed
US-7863347-B2 Resin composition, varnish, resin film and semiconductor device using the same SUMITOMO BAKELITE COMPANY, LTD. (JP) 2011-01-04 US disclosed
US-7652125-B2 Resin composition, polyimide resin composition, polybenzoxazole resin composition, varnish, resin film and semiconductor device using the same SUMITOMO BAKELITE COMPANY, LTD. (JP) 2010-01-26 US disclosed
US-20090118431-A1 RESIN COMPOSITION, VARNISH, RESIN FILM AND SEMICONDUCTOR DEVICE USING THE SAME SUMITOMO BAKELITE COMPANY, LTD (JP) 2009-05-07 US disclosed
EP-2000510-A1 RESIN COMPOSITION, VARNISH, RESIN FILM, AND SEMICONDUCTOR DEVICE USING THE RESIN FILM Sumitomo Bakelite Company, Ltd. (JP) 2008-12-10 EP disclosed
US-20080255335-A1 Resin Composition, Polyimide Resin Composition, Polybenzoxazole Resin Composition, Varnish, Resin Film and Semiconductor Device Using the Same SUMITOMO BAKELITE COMPANY LTD. (JP) 2008-10-16 US disclosed
EP-1813637-A1 RESIN COMPOSITION, POLYIMIDE RESIN COMPOSITION, POLY- BENZOXAZOLE RESIN COMPOSITION, VARNISHES, RESIN FILMS AND SEMICONDUCTOR DEVICES MADE BY USING THE SAME Sumitomo Bakelite Company, Limited (JP) 2007-08-01 EP disclosed