Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.61 |
| ▸ | THRB | P10828 | 1/20 | 0.61 |
| ▸ | DNM1 | Q05193 | 8/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.44 |
| ▸ | LMNA | P02545 | 2/20 | 0.44 |
| ▸ | MEN1 | O00255 | 2/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.44 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7616706 | 1.00 | TSHR (0.61) | TSHRTHRBDNM1ALDH1A1LMNA | |
| SCHEMBL28162 | 1.00 | — | — | |
| SCHEMBL51303 | 1.00 | TSHR (0.61) | TSHRTHRBDNM1ALDH1A1LMNA | |
| SCHEMBL2734278 | 1.00 | TSHR (0.61) | TSHRTHRBDNM1ALDH1A1LMNA | |
| SCHEMBL21048444 | 1.00 | TSHR (0.61) | TSHRTHRBDNM1ALDH1A1LMNA | |
| SCHEMBL23668483 | 1.00 | TSHR (0.61) | TSHRTHRBDNM1ALDH1A1LMNA | |
| SCHEMBL5675255 | 1.00 | TSHR (0.61) | TSHRTHRBDNM1ALDH1A1LMNA | |
| SCHEMBL15158032 | 1.00 | TSHR (0.61) | TSHRTHRBDNM1ALDH1A1LMNA | |
| SCHEMBL20943436 | 1.00 | TSHR (0.61) | TSHRTHRBDNM1ALDH1A1LMNA | |
| SCHEMBL2734408 | 1.00 | TSHR (0.61) | TSHRTHRBDNM1ALDH1A1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 467 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260123372-A1 | MANUFACTURING SEMICONDUCTOR DEVICE USING SELECTIVE DIELECTRIC ON DIELECTRIC (DOD) DEPOSITION PROCESS | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-04-30 | — | — | US | claimed |
| US-12518966-B2 | Selective plasma enhanced atomic layer deposition | VERSUM MATERIALS US, LLC (US) | 2026-01-06 | — | — | US | claimed |
| US-20250326969-A1 | INTERCONNECTED NANODOMAIN NETWORKS, METHODS OF MAKING, AND USES THEREOF | UNIV FLORIDA (US) | 2025-10-23 | — | — | US | claimed |
| EP-4358119-A2 | IMPROVED SELF-ASSEMBLED MONOLAYER BLOCKING WITH INTERMITTENT AIR-WATER EXPOSURE | Applied Materials, Inc. (US) | 2024-04-24 | — | — | EP | claimed |
| US-20240047196-A1 | SELECTIVE THERMAL ATOMIC LAYER DEPOSITION | VERSUM MAT US LLC (US) | 2024-02-08 | — | — | US | claimed |
| US-20240014036-A1 | SELECTIVE PLASMA ENHANCED ATOMIC LAYER DEPOSITION | VERSUM MATERIALS US, LLC | 2024-01-11 | — | — | US | claimed |
| WO-2024006737-A2 | INTERCONNECTED NANODOMAIN NETWORKS, METHODS OF MAKING, AND USES THEREOF | UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC. (US) | 2024-01-04 | — | — | WO | claimed |
| CN-117334560-A | Improved self-assembled monolayer blocking with intermittent air-water exposure | 应用材料公司 | 2024-01-02 | — | — | CN | claimed |
| CN-116918029-A | selective thermal atomic layer deposition | 弗萨姆材料美国有限责任公司 | 2023-10-20 | — | — | CN | claimed |
| CN-116761906-A | Selective plasma enhanced atomic layer deposition | 弗萨姆材料美国有限责任公司 | 2023-09-15 | — | — | CN | claimed |
| US-20120175022-A1 | ANTI-TARNISH COATINGS | ENTHONE INC. (US) | 2012-07-12 | — | — | US | claimed |
| US-8216649-B2 | Liquid crystal aligning agent, method of producing a liquid crystal alignment film and liquid crystal display device | JSR CORPORATION (JP) | 2012-07-10 | — | — | US | claimed |
| US-7972655-B2 | Anti-tarnish coatings | ENTHONE INC. (US) | 2011-07-05 | — | — | US | claimed |
| CN-101925553-A | Anti-tarnish coating | ENTHONE | 2010-12-22 | — | — | CN | claimed |
| US-20100291303-A1 | ANTI-TARNISH COATINGS | ENTHONE INC. (US) | 2010-11-18 | — | — | US | claimed |
| EP-2220009-A1 | ANTI-TARNISH COATING | Enthone, Inc. (US) | 2010-08-25 | — | — | EP | claimed |
| US-20100151263-A1 | METALLIC SURFACE ENHANCEMENT | ENTHONE INC. (US) | 2010-06-17 | — | — | US | claimed |
| EP-2142485-A1 | METALLIC SURFACE ENHANCEMENT | Enthone, Inc. (US) | 2010-01-13 | — | — | EP | claimed |
| WO-2009067446-A1 | ANTI-TARNISH COATING | ENTHONE INC. (US) | 2009-05-28 | — | — | WO | claimed |
| WO-2008131206-A1 | METALLIC SURFACE ENHANCEMENT | ENTHONE INC. (US) | 2008-10-30 | — | — | WO | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260123372-A1 | MANUFACTURING SEMICONDUCTOR DEVICE USING SELECTIVE DIELECTRIC ON DIELECTRIC (DOD) DEPOSITION PROCESS | PDK1, HPD, HAO2 | TSHR 4501/4885THRB 3793/4885DNM1 2417/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.