SCHEMBL27095772

SCHEMBL27095772

CCCCC(CC)COCCCNCn1nnc2cc(C(=O)O)ccc21

nearest known ligand 0.53

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
▸ HCAR3 P49019 15/20 0.53
▸ PLA2G4A P47712 1/20 0.43
▸ RXRA P19793 2/20 0.42
▸ MMP9 P14780 1/20 0.41
▸ MMP8 P22894 1/20 0.41
▸ MMP14 P50281 1/20 0.41
▸ HPGD P15428 1/20 0.40
▸ HCAR2 Q8TDS4 1/20 0.40
▸ MAPT P10636 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4379611 0.80 HCAR3 (0.67) HCAR3PLA2G4ARXRAHPGDHCAR2
SCHEMBL4384183 0.80 HCAR3 (0.67) HCAR3PLA2G4ARXRAHPGDHCAR2
SCHEMBL4379977 0.80 HCAR3 (0.67) HCAR3PLA2G4ARXRAHPGDHCAR2
SCHEMBL30038487 0.77 HCAR3 (0.61) HCAR3PLA2G4ARXRAHPGDHCAR2
SCHEMBL7159337 0.77 HCAR3 (0.61) HCAR3PLA2G4ARXRAHPGDHCAR2
SCHEMBL16610490 0.75 HCAR3 (0.58) HCAR3PLA2G4ARXRAHPGDHCAR2
SCHEMBL18033713 0.75 HCAR3 (0.53) HCAR3PLA2G4ARXRAHPGDHCAR2
SCHEMBL4384823 0.74 HCAR3 (0.59) HCAR3PLA2G4ARXRAHPGDHCAR2
SCHEMBL16610515 0.74 HCAR3 (0.62) HCAR3HPGDHCAR2MAPT
SCHEMBL4378316 0.72 HCAR3 (0.52) HCAR3PLA2G4ARXRAHPGDMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240059803-A1 PHOTOSENSITIVE RESIN MULTILAYER BODY AND METHOD FOR PRODUCING SAME ASAHI KASEI KABUSHIKI KAISHA (JP) 2024-02-22 — — US disclosed
CN-116981999-A Photosensitive resin laminate and method for producing same 旭化成株式会社 2023-10-31 — — CN disclosed
CN-111527450-B Photosensitive resin laminate and method for producing same 旭化成株式会社 2023-08-08 — — CN disclosed
CN-115524922-A Photosensitive resin composition 旭化成株式会社 2022-12-27 — — CN disclosed
CN-110325913-B Photosensitive resin composition 旭化成株式会社 2022-11-01 — — CN disclosed
CN-111527450-A Photosensitive resin laminate and method for producing same 旭化成株式会社 2020-08-11 — — CN disclosed
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