Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HCAR3 | P49019 | 13/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.47 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.47 |
| ▸ | TSHR | P16473 | 1/20 | 0.47 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.47 |
| ▸ | LMNA | P02545 | 1/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.47 |
| ▸ | HPGD | P15428 | 1/20 | 0.46 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.46 |
| ▸ | RXRA | P19793 | 2/20 | 0.44 |
| ▸ | CA2 | P00918 | 1/20 | 0.43 |
| ▸ | PLA2G4A | P47712 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18031574 | 0.87 | ALDH1A1 (0.44) | HCAR3ALDH1A1CYP3A4TSHRMAPK1 | |
| SCHEMBL18156658 | 0.81 | ALDH1A1 (0.47) | HCAR3ALDH1A1CYP3A4TSHRMAPK1 | |
| SCHEMBL18033701 | 0.81 | ALDH1A1 (0.47) | HCAR3ALDH1A1CYP3A4TSHRMAPK1 | |
| SCHEMBL16610515 | 0.76 | HCAR3 (0.62) | HCAR3HPGDHCAR2 | |
| SCHEMBL27095772 | 0.75 | HCAR3 (0.53) | HCAR3HPGDHCAR2RXRAPLA2G4A | |
| SCHEMBL30038487 | 0.75 | HCAR3 (0.61) | HCAR3HPGDHCAR2RXRAPLA2G4A | |
| SCHEMBL7159337 | 0.75 | HCAR3 (0.61) | HCAR3HPGDHCAR2RXRAPLA2G4A | |
| SCHEMBL18033712 | 0.74 | HCAR3 (0.60) | HCAR3HPGDHCAR2 | |
| SCHEMBL18033708 | 0.73 | HCAR3 (0.60) | HCAR3HPGDHCAR2 | |
| SCHEMBL108086 | 0.72 | ALDH1A1 (0.73) | ALDH1A1CYP3A4TSHRMAPK1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9740098-B2 | Chemically amplified negative resist composition using novel onium salt and resist pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-08-22 | — | — | US | disclosed |
| US-9720323-B2 | Chemically amplified positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-08-01 | — | — | US | disclosed |
| EP-3081987-A2 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION USING NOVEL ONIUM SALT AND RESIST PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2016-10-19 | — | — | EP | disclosed |
| US-20160299428-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION USING NOVEL ONIUM SALT AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-10-13 | — | — | US | disclosed |
| EP-3062150-A2 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2016-08-31 | — | — | EP | disclosed |
| US-20160246175-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-08-25 | — | — | US | disclosed |