SCHEMBL2709586

SCHEMBL2709586

O=C(O)c1ccccc1C1(c2ccccc2C(=O)O)c2cc(C34CC5CC(CC(C5)C3)C4)ccc2-c2ccc(C34CC5CC(CC(C5)C3)C4)cc21

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.46
KMT2A Q03164 3/20 0.46
POLB P06746 1/20 0.46
GAA P10253 1/20 0.46
GFER P55789 1/20 0.46
HIF1A Q16665 3/20 0.45
EPAS1 Q99814 3/20 0.45
SERPINE1 P05121 2/20 0.44
KDM4E B2RXH2 2/20 0.41
NPC1 O15118 1/20 0.38
RARA P10276 3/20 0.38
RARB P10826 3/20 0.38
RARG P13631 3/20 0.38
ALDH1A1 P00352 2/20 0.37
EPHX2 P34913 2/20 0.37
TP53 P04637 1/20 0.37
CYP3A4 P08684 1/20 0.37
MAPT P10636 1/20 0.37
HPGD P15428 1/20 0.37
ALOX15 P16050 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL2707867 0.99 KMT2A (0.44) MEN1KMT2APOLBGAAGFER
SCHEMBL2708180 0.83 PTPN11 (0.40) POLBHIF1AEPAS1SERPINE1NPC1
SCHEMBL2708378 0.83 SERPINE1 (0.45) MEN1KMT2APOLBGAAGFER
Hydrochloric Acid SCHEMBL3175784 0.83 PTPN11 (0.39) POLBHIF1AEPAS1SERPINE1NPC1
SCHEMBL2710151 0.82 SERPINE1 (0.41) MEN1KMT2APOLBGAAGFER
SCHEMBL2707994 0.81 HIF1A (0.42) MEN1KMT2APOLBHIF1AEPAS1
SCHEMBL2710161 0.80 RARB (0.48) MEN1KMT2APOLBGAAGFER
SCHEMBL5475249 0.79 KDM4E (0.53) MEN1KMT2AHIF1AEPAS1KDM4E
SCHEMBL2707905 0.79 HIF1A (0.42) MEN1KMT2AHIF1AEPAS1SERPINE1
SCHEMBL2707997 0.76 POLB (0.41) MEN1KMT2APOLBGAAGFER

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2000510-B1 RESIN COMPOSITION, VARNISH, RESIN FILM, AND SEMICONDUCTOR DEVICE USING THE RESIN FILM SUMITOMO BAKELITE CO (JP) 2012-05-02 EP disclosed
US-7863347-B2 Resin composition, varnish, resin film and semiconductor device using the same SUMITOMO BAKELITE COMPANY, LTD. (JP) 2011-01-04 US disclosed
US-7652125-B2 Resin composition, polyimide resin composition, polybenzoxazole resin composition, varnish, resin film and semiconductor device using the same SUMITOMO BAKELITE COMPANY, LTD. (JP) 2010-01-26 US disclosed
US-20090118431-A1 RESIN COMPOSITION, VARNISH, RESIN FILM AND SEMICONDUCTOR DEVICE USING THE SAME SUMITOMO BAKELITE COMPANY, LTD (JP) 2009-05-07 US disclosed
EP-2000510-A1 RESIN COMPOSITION, VARNISH, RESIN FILM, AND SEMICONDUCTOR DEVICE USING THE RESIN FILM Sumitomo Bakelite Company, Ltd. (JP) 2008-12-10 EP disclosed
US-20080255335-A1 Resin Composition, Polyimide Resin Composition, Polybenzoxazole Resin Composition, Varnish, Resin Film and Semiconductor Device Using the Same SUMITOMO BAKELITE COMPANY LTD. (JP) 2008-10-16 US disclosed
EP-1813637-A1 RESIN COMPOSITION, POLYIMIDE RESIN COMPOSITION, POLY- BENZOXAZOLE RESIN COMPOSITION, VARNISHES, RESIN FILMS AND SEMICONDUCTOR DEVICES MADE BY USING THE SAME Sumitomo Bakelite Company, Limited (JP) 2007-08-01 EP disclosed