SCHEMBL27099786

SCHEMBL27099786

CC1(c2ccccc2)CCN(C(=O)CI)CC1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADAMTS5 Q9UNA0 1/20 0.51
OPRM1 P35372 5/20 0.49
HTT P42858 1/20 0.43
BLM P54132 1/20 0.43
GRM5 P41594 1/20 0.43
ALDH1A1 P00352 2/20 0.42
CYP1A2 P05177 1/20 0.42
SCD5 Q86SK9 1/20 0.41
EPHX2 P34913 4/20 0.41
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
HSD11B1 P28845 1/20 0.41
OPRD1 P41143 2/20 0.40
OPRK1 P41145 2/20 0.40
SLC22A1 O15245 1/20 0.40
SLC6A4 P31645 1/20 0.40
ADRA1A P35348 1/20 0.40
KCNH2 Q12809 1/20 0.40
OPRL1 P41146 1/20 0.40
LMNA P02545 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18793811 0.86 OPRM1 (0.66) ADAMTS5OPRM1BLMGRM5ALDH1A1
SCHEMBL29338182 0.84 OPRM1 (0.52) ADAMTS5OPRM1HTTBLMGRM5
SCHEMBL27099821 0.84 ADAMTS5 (0.51) ADAMTS5OPRM1HTTBLMGRM5
SCHEMBL13997703 0.82 ADAMTS5 (0.49) ADAMTS5OPRM1HTTBLMGRM5
SCHEMBL5559794 0.82 OPRM1 (0.47) ADAMTS5OPRM1ALDH1A1SCD5EPHX2
SCHEMBL18088809 0.81 ADAMTS5 (0.48) ADAMTS5OPRM1BLMGRM5ALDH1A1
SCHEMBL27099820 0.81 ADAMTS5 (0.48) ADAMTS5OPRM1BLMGRM5ALDH1A1
SCHEMBL18088638 0.80 USP2 (0.57) ADAMTS5OPRM1ALDH1A1CYP1A2MEN1
SCHEMBL18088639 0.79 OPRM1 (0.49) ADAMTS5OPRM1ALDH1A1SCD5EPHX2
SCHEMBL27099823 0.79 ADAMTS5 (0.51) ADAMTS5OPRM1ALDH1A1SCD5EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11914294-B2 Positive resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-02-27 US disclosed
US-11914294-B2 Positive resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-02-27 US disclosed