Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.62 |
| ▸ | TSHR | P16473 | 4/20 | 0.62 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.44 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.44 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.44 |
| ▸ | PGR | P06401 | 1/20 | 0.44 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.44 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.44 |
| ▸ | HTR1A | P08908 | 1/20 | 0.44 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.44 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.44 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.44 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.44 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.44 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.44 |
| ▸ | CHRNA10 | Q9GZZ6 | 1/20 | 0.44 |
| ▸ | CHRNA9 | Q9UGM1 | 1/20 | 0.44 |
| ▸ | GALR3 | O60755 | 2/20 | 0.43 |
| ▸ | GAA | P10253 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10348268 | 1.00 | ALDH1A1 (0.62) | ALDH1A1TSHRCHRM5CHRM1CHRM3 | |
| SCHEMBL5241372 | 1.00 | ALDH1A1 (0.62) | ALDH1A1TSHRCHRM5CHRM1CHRM3 | |
| SCHEMBL144109 | 1.00 | ALDH1A1 (0.62) | ALDH1A1TSHRCHRM5CHRM1CHRM3 | |
| SCHEMBL2702088 | 1.00 | ALDH1A1 (0.62) | ALDH1A1TSHRCHRM5CHRM1CHRM3 | |
| SCHEMBL17932923 | 1.00 | ALDH1A1 (0.62) | ALDH1A1TSHRCHRM5CHRM1CHRM3 | |
| SCHEMBL10348270 | 1.00 | ALDH1A1 (0.62) | ALDH1A1TSHRCHRM5CHRM1CHRM3 | |
| SCHEMBL16815101 | 0.98 | ALDH1A1 (0.60) | ALDH1A1TSHRCHRM5CHRM1CHRM3 | |
| SCHEMBL5859306 | 0.98 | ALDH1A1 (0.60) | ALDH1A1TSHRCHRM5CHRM1CHRM3 | |
| Acetic Acid SCHEMBL28166428 | 0.95 | ALDH1A1 (0.58) | ALDH1A1TSHRCHRM5CHRM1CHRM3 | |
| Ethylene Glycol SCHEMBL545519 | 0.93 | ALDH1A1 (0.56) | ALDH1A1TSHRCHRM5CHRM1CHRM3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1991 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111936936-B | Imidazolidinone-containing compositions for removal of post-ash residues and/or for oxide etching of TiN-containing layers or masks | 巴斯夫欧洲公司 | 2025-02-21 | — | — | CN | claimed |
| EP-3558917-B1 | NOVEL COMPOUND, SEMICONDUCTOR MATERIAL, AND METHODS FOR MANUFACTURING COATING AND SEMICONDUCTOR USING THE SAME | MERCK PATENT GMBH (DE) | 2024-01-24 | — | — | EP | claimed |
| CN-110088072-B | Novel compound, semiconductor material, film using same, and method for producing semiconductor | 默克专利有限公司 | 2023-05-02 | — | — | CN | claimed |
| CN-109423291-B | Etching solution for selectively removing silicon-germanium alloy from silicon-germanium/silicon stack in the manufacture of semiconductor devices | 弗萨姆材料美国有限责任公司 | 2022-09-30 | — | — | CN | claimed |
| US-11450805-B2 | Compound, semiconductor material, and methods for manufacturing coating and semiconductor using the same | MERCK PATENT GMBH (DE) | 2022-09-20 | — | — | US | claimed |
| CN-114940926-A | Cleaning preparation | 弗萨姆材料美国有限责任公司 | 2022-08-26 | — | — | CN | claimed |
| CN-111936936-A | Imidazolidinethione-containing compositions for removing post-ashing residues and/or for oxidatively etching TiN-containing layers or masks | 巴斯夫欧洲公司 | 2020-11-13 | — | — | CN | claimed |
| US-20200044158-A1 | NOVEL COMPOUND, SEMICONDUCTOR MATERIAL, AND METHODS FOR MANUFACTURING COATING AND SEMICONDUCTOR USING THE SAME | MERCK PATENT GMBH (DE) | 2020-02-06 | — | — | US | claimed |
| CN-110713868-A | Post etch residue cleaning solution capable of removing titanium nitride | 巴斯夫欧洲公司 | 2020-01-21 | — | — | CN | claimed |
| EP-3558917-A1 | NOVEL COMPOUND, SEMICONDUCTOR MATERIAL, AND METHODS FOR MANUFACTURING COATING AND SEMICONDUCTOR USING THE SAME | Merck Patent GmbH (DE) | 2019-10-30 | — | — | EP | claimed |
| WO-2018099848-A1 | PLANARISING COATING-FORMING COMPOSITION AND METHODS FOR MANUFACTURING PLANARIZING COATING AND DEVICE USING THE SAME | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2018-06-07 | — | — | WO | claimed |
| WO-2018099836-A1 | PLANARIZING COATING-FORMING COMPOSITION AND METHODS FOR MANUFACTURING PLANARIZING COATING AND DEVICE USING THE SAME | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2018-06-07 | — | — | WO | claimed |
| CN-102453149-A | Olefin polymerization catalyst component, olefin polymerization catalyst, and olefin polymerization method | CHINA PETROLEUM & CHEMICAL | 2012-05-16 | — | — | CN | claimed |
| CN-101760355-A | The wet clean compositions that is used for CoWP and porous dielectric | AIR PROD & CHEM | 2010-06-30 | — | — | CN | claimed |
| EP-2199379-A1 | Wet clean compositions for CoWP and porous dielectrics | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-06-23 | — | — | EP | claimed |
| US-20100152086-A1 | Wet Clean Compositions for CoWP and Porous Dielectrics | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-06-17 | — | — | US | claimed |
| US-20060011584-A1 | Etchant and etching method | DAIKIN INDUSTRIES, LTD. (JP) | 2006-01-19 | — | — | US | claimed |
| EP-1538664-A1 | ETCHANT AND ETCHING METHOD | Daikin Industries, Ltd. (JP) | 2005-06-08 | — | — | EP | claimed |
| US-6334886-B1 | Removal of corrosive contaminants from alkanolamine absorbent process | AIR PRODUCTS AND CHEMICALS, INC. | 2002-01-01 | — | — | US | claimed |
| US-4536633-A | Dielectric fluid for electrical discharge machining | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 1985-08-20 | — | — | US | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11450805-B2 | Compound, semiconductor material, and methods for manufacturing coating and semiconductor using the same | TYR, CD99, SRM | ALDH1A1 3593/4885TSHR 3618/4885CHRM5 791/4885 |
| US-20200044158-A1 | NOVEL COMPOUND, SEMICONDUCTOR MATERIAL, AND METHODS FOR MANUFACTURING COATING AND SEMICONDUCTOR USING THE SAME | TYR, TRPA1, CD99 | ALDH1A1 3646/4885TSHR 3881/4885CHRM5 660/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.