Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Triethylene Glycol. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADRB2 known ✓ | P07550 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 3/20 | 0.58 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.58 |
| ▸ | TSHR | P16473 | 6/20 | 0.53 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.53 |
| ▸ | THRB | P10828 | 2/20 | 0.44 |
| ▸ | HTT | P42858 | 1/20 | 0.44 |
| ▸ | MAPT | P10636 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.43 |
| ▸ | FFAR3 | O14843 | 1/20 | 0.37 |
| ▸ | LCK | P06239 | 1/20 | 0.37 |
| ▸ | FYN | P06241 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.34 |
| ▸ | BLM | P54132 | 1/20 | 0.34 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.31 |
| ▸ | TP53 | P04637 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Di(Hydroxyethyl)Ether SCHEMBL1561767 | 0.97 | TSHR (0.56) | MEN1KMT2ATSHRMAPK1THRB | |
| Triethylene Glycol SCHEMBL994880 | 0.95 | MEN1 (0.65) | MEN1KMT2ATSHRMAPK1THRB | |
| Acetic Acid SCHEMBL21878891 | 0.95 | MEN1 (0.65) | MEN1KMT2ATSHRMAPK1THRB | |
| Tetraethylene Glycol SCHEMBL28411928 | 0.95 | MEN1 (0.65) | MEN1KMT2ATSHRMAPK1THRB | |
| Triethylene Glycol SCHEMBL27352527 | 0.95 | MEN1 (0.65) | MEN1KMT2ATSHRMAPK1THRB | |
| Pentaethylene Glycol SCHEMBL9614725 | 0.95 | MEN1 (0.65) | MEN1KMT2ATSHRMAPK1THRB | |
| Triethylene Glycol SCHEMBL7049732 | 0.95 | MEN1 (0.65) | MEN1KMT2ATSHRMAPK1THRB | |
| Acetic Acid SCHEMBL21878939 | 0.95 | MEN1 (0.65) | MEN1KMT2ATSHRMAPK1THRB | |
| Acetic Acid SCHEMBL28250665 | 0.95 | MEN1 (0.65) | MEN1KMT2ATSHRMAPK1THRB | |
| Tetraethylene Glycol SCHEMBL5632111 | 0.95 | MEN1 (0.65) | MEN1KMT2ATSHRMAPK1THRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 169 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4347062-A | Complexes of high iron content soluble in organic media and usable as combustion additives in liquid fuels | INSTITUT FRANCAIS DU PETROLE (FR) | 1982-08-31 | — | — | US | claimed |
| US-20260125594-A1 | QUANTUM DOT-CONTAINING COMPOSITION AND METHOD FOR PRODUCING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-05-07 | — | — | US | disclosed |
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-30 | — | — | US | disclosed |
| EP-4715465-A1 | MULTILAYER BODY, METHOD FOR PRODUCING MULTILAYER BODY, AND PHOTOSENSITIVE SURFACE MODIFIER | Nissan Chemical Corporation (JP) | 2026-03-25 | — | — | EP | disclosed |
| CN-121586750-A | Composition for forming silicon-containing underlayer film for directional self-assembly | 日产化学株式会社 | 2026-02-27 | — | — | CN | disclosed |
| EP-4679175-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | Nissan Chemical Corporation (JP) | 2026-01-14 | — | — | EP | disclosed |
| US-20250377596-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-12-11 | — | — | US | disclosed |
| US-20250362609-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYFUNCTIONAL SULFONIC ACID | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-27 | — | — | US | disclosed |
| US-20250355357-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-20 | — | — | US | disclosed |
| US-20250348001-A1 | METHOD FOR PRODUCING LAMINATE AND METHOD FOR PRODUCING SEMICONDUCTOR ELEMENT | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-13 | — | — | US | disclosed |
| US-20050131091-A1 | Process for producing synthetic resin foam, blowing agent and premix | DAIKIN INDUSTRIES, LTD. (JP) | 2005-06-16 | — | — | US | disclosed |
| US-20050043422-A1 | Process for producing synthetic resin foam | DAIKIN INDUSTRIES, LTD. (JP) | 2005-02-24 | — | — | US | disclosed |
| US-6849385-B2 | Photosensitive resin composition, process of forming patterns with the same, and electronic components | HITACHI CHEMICAL CO., LTD. (JP) | 2005-02-01 | — | — | US | disclosed |
| EP-1498439-A1 | PROCESS FOR PRODUCING SYNTHETIC RESIN FOAM, BLOWING AGENT, AND PREMIX | Daikin Industries, Ltd. (JP) | 2005-01-19 | — | — | EP | disclosed |
| US-20040180286-A1 | Photosensitive resin composition, process of forming patterns with the same, and electronic components | HITACHI CHEMICAL CO., LTD. (JP) | 2004-09-16 | — | — | US | disclosed |
| EP-1457506-A1 | PROCESS FOR PRODUCING SYNTHETIC RESIN FOAM | Daikin Industries, Ltd. (JP) | 2004-09-15 | — | — | EP | disclosed |
| CN-1522388-A | Photosensitive resin composition, method for producing pattern and electronic parts | 日立化成工业株式会社 | 2004-08-18 | — | — | CN | disclosed |
| US-6596446-B2 | Used in in printing inks | BAYER AKTIENGESELLSCHAFT (DE) | 2003-07-22 | — | — | US | disclosed |
| US-20020034696-A1 | Organic pigments in color filters of liquid crystal display | LANXESS DEUTSCHLAND GMBH (DE) | 2002-03-21 | — | — | US | disclosed |
| US-4347062-A | Complexes of high iron content soluble in organic media and usable as combustion additives in liquid fuels | INSTITUT FRANCAIS DU PETROLE (FR) | 1982-08-31 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | SRSF1, MACF1, SRPK1 | ADRB2 4696/4885MEN1 2480/4885KMT2A 111/4885 |
| US-20260125594-A1 | QUANTUM DOT-CONTAINING COMPOSITION AND METHOD FOR PRODUCING THE SAME | ITGA6, STRA6, ILK | ADRB2 3758/4885MEN1 4558/4885KMT2A 1830/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.