Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NR4A1 | P22736 | 1/20 | 0.61 |
| ▸ | CYP3A4 | P08684 | 6/20 | 0.54 |
| ▸ | TSHR | P16473 | 6/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.52 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.52 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.47 |
| ▸ | GAA | P10253 | 2/20 | 0.46 |
| ▸ | MAOA | P21397 | 1/20 | 0.44 |
| ▸ | MAOB | P27338 | 1/20 | 0.44 |
| ▸ | HPGD | P15428 | 2/20 | 0.43 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.43 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.43 |
| ▸ | THRB | P10828 | 1/20 | 0.43 |
| ▸ | CASP1 | P29466 | 1/20 | 0.43 |
| ▸ | RECQL | P46063 | 1/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.43 |
| ▸ | CA12 | O43570 | 1/20 | 0.43 |
| ▸ | CA1 | P00915 | 1/20 | 0.43 |
| ▸ | CA2 | P00918 | 1/20 | 0.43 |
| ▸ | CA4 | P22748 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7192417 | 0.91 | MAOA (0.59) | NR4A1CYP3A4TSHRALDH1A1MAPK1 | |
| SCHEMBL3795020 | 0.89 | MAOA (0.54) | NR4A1CYP3A4TSHRALDH1A1MAPK1 | |
| SCHEMBL7181922 | 0.86 | MAOB (0.60) | NR4A1CYP3A4TSHRALDH1A1MAPK1 | |
| SCHEMBL28682827 | 0.86 | HTT (0.58) | NR4A1CYP3A4TSHRALDH1A1MAPK1 | |
| SCHEMBL7190411 | 0.84 | CYP3A4 (0.45) | NR4A1CYP3A4TSHRALDH1A1MAPK1 | |
| SCHEMBL2807638 | 0.83 | SOS1 (0.54) | NR4A1CYP3A4TSHRALDH1A1MAPK1 | |
| SCHEMBL1897083 | 0.83 | NOS3 (0.50) | NR4A1CYP3A4TSHRALDH1A1MAPK1 | |
| SCHEMBL10769469 | 0.83 | NR4A1 (0.44) | NR4A1CYP3A4TSHRALDH1A1MAPK1 | |
| SCHEMBL16655993 | 0.83 | NR4A1 (0.44) | NR4A1CYP3A4TSHRALDH1A1MAPK1 | |
| SCHEMBL16665381 | 0.83 | CYP3A4 (0.52) | NR4A1CYP3A4TSHRALDH1A1MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 487 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3405453-B1 | A METHOD FOR PREPARING POLY(CARBONATE-ETH ERIMIDE) COMPOUND | PTT GLOBAL CHEMICAL PUBLIC CO LTD (TH) | 2024-05-29 | — | — | EP | claimed |
| US-10759904-B2 | Method for preparing poly(carbonate-etherimide) compound | PTT GLOBAL CHEMICAL PUBLIC COMPANY LIMITED (TH) | 2020-09-01 | — | — | US | claimed |
| US-20190202980-A1 | METHOD FOR PREPARING POLY(CARBONATE-ETHERIMIDE) COMPOUND | PTT GLOBAL CHEMICAL PUBLIC COMPANY LIMITED (TH) | 2019-07-04 | — | — | US | claimed |
| EP-3405453-A2 | A METHOD FOR PREPARING POLY(CARBONATE-ETH ERIMIDE) COMPOUND | PTT Global Chemical Public Company Limited (TH) | 2018-11-28 | — | — | EP | claimed |
| US-9248408-B2 | Hollow-fiber element for organic-vapor separation | UBE INDUSTRIES, LTD. (JP) | 2016-02-02 | — | — | US | claimed |
| EP-1579272-A4 | STABLE NON-PHOTOSENSITIVE POLYIMIDE PRECURSOR COMPOSITIONS FOR USE IN BILAYER IMAGING SYSTEMS | FUJIFILM ELECTRONIC MATERIALS (US) | 2008-12-17 | — | — | EP | claimed |
| US-7416830-B2 | Photosensitive resin compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2008-08-26 | — | — | US | claimed |
| US-20070009751-A1 | Polyamic acid resin composition modified with laminate nanometer silica sheet and polyimide prepared therefrom | CHANG CHUN PLASTICS CO., LTD. (TW) | 2007-01-11 | — | — | US | claimed |
| EP-1680711-A2 | NOVEL PHOTOSENSITIVE RESIN COMPOSITIONS | Fujifilm Electronic Materials USA, Inc. (US) | 2006-07-19 | — | — | EP | claimed |
| US-7018776-B2 | Stable non-photosensitive polyimide precursor compositions for use in bilayer imaging systems | ARCH SPECIALTY CHEMICALS, INC. (US) | 2006-03-28 | — | — | US | claimed |
| WO-2005038524-A2 | NOVEL PHOTOSENSITIVE RESIN COMPOSITIONS | ARCH SPECIALTY CHEMICALS, INC. (US) | 2005-04-28 | — | — | WO | claimed |
| US-20040161711-A1 | Stable non-photosensitive polyimide precursor compositions for use in bilayer imaging systems | ARCH SPECIALTY CHEMICALS, INC. | 2004-08-19 | — | — | US | claimed |
| US-20040161619-A1 | Process for producing a heat resistant relief structure | ARCH SPECIALTY CHEMICALS, INC. | 2004-08-19 | — | — | US | claimed |
| WO-2004055593-A2 | PROCESS FOR PRODUCING A HEAT RESISTANT RELIEF STRUCTURE | ARCH SPECIALTY CHEMICALS, INC. (US) | 2004-07-01 | — | — | WO | claimed |
| WO-2004055592-A2 | STABLE NON-PHOTOSENSITIVE POLYIMIDE PRECURSOR COMPOISTIONS FOR USE IN BILAYER IMAGING SYSTEMS | ARCH SPECIALTY CHEMICALS, INC. (US) | 2004-07-01 | — | — | WO | claimed |
| US-20040077819-A1 | Anti-bacterial polymer and method for the preparation thereof, anti-bacterial polymer film and method for the preparation thereof, and article having such a film on the surface thereof | ULVAC, INC. (JP) | 2004-04-22 | — | — | US | claimed |
| EP-1396514-A1 | Anti-bacterial polymer and method for the preparation thereof, anti-bacterial polymer film and method for the preparation thereof, and article having such a film on the surface thereof | ULVAC, INC. (JP) | 2004-03-10 | — | — | EP | claimed |
| US-4886873-A | ELASTICITY AND HEAT RESISTANCE | DIRECTOR-GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 1989-12-12 | — | — | US | claimed |
| US-4172937-A | REACTION OF A DIALDEHYDE AND DIAMINE IN A PHENOLIC COMPOUND | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1979-10-30 | — | — | US | claimed |
| US-4107151-A | FROM POLYISOCYANATE, CHAIN POLYOL, AROMATIC DIAMINE, POLYOL OR AMINO ALCOHOL WITH URETHANE BOND | IHARA CHEMICAL COMPANY CO., LTD. (JP) | 1978-08-15 | — | — | US | claimed |