Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 4/20 | 0.59 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.53 |
| ▸ | F2 | P00734 | 2/20 | 0.49 |
| ▸ | PRSS1 | P07477 | 2/20 | 0.49 |
| ▸ | PRSS2 | P07478 | 2/20 | 0.49 |
| ▸ | PRSS3 | P35030 | 2/20 | 0.49 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.49 |
| ▸ | MCOLN3 | Q8TDD5 | 2/20 | 0.47 |
| ▸ | TSHR | P16473 | 1/20 | 0.47 |
| ▸ | CA1 | P00915 | 2/20 | 0.47 |
| ▸ | CA2 | P00918 | 2/20 | 0.47 |
| ▸ | CA9 | Q16790 | 1/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.46 |
| ▸ | PKM | P14618 | 2/20 | 0.45 |
| ▸ | ATM | Q13315 | 1/20 | 0.45 |
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.43 |
| ▸ | GAA | P10253 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3436103 | 0.82 | LMNA (0.57) | LMNAL3MBTL1F2PRSS1PRSS2 | |
| SCHEMBL23520947 | 0.82 | LMNA (0.57) | LMNAL3MBTL1F2PRSS1PRSS2 | |
| SCHEMBL29515858 | 0.82 | L3MBTL1 (0.61) | LMNAL3MBTL1F2PRSS1PRSS2 | |
| SCHEMBL384730 | 0.82 | L3MBTL1 (0.61) | LMNAL3MBTL1F2PRSS1PRSS2 | |
| SCHEMBL751596 | 0.79 | LMNA (0.53) | LMNAL3MBTL1F2PRSS1PRSS2 | |
| SCHEMBL6113091 | 0.78 | LMNA (0.63) | LMNAL3MBTL1F2PRSS1PRSS2 | |
| SCHEMBL1952494 | 0.78 | LMNA (0.68) | LMNAL3MBTL1F2PRSS1PRSS2 | |
| SCHEMBL294027 | 0.76 | LMNA (0.65) | LMNAL3MBTL1F2PRSS1PRSS2 | |
| SCHEMBL13941253 | 0.75 | CA1 (0.50) | LMNATSHRCA1CA2CA9 | |
| SCHEMBL31420206 | 0.74 | LMNA (0.49) | LMNAL3MBTL1F2PRSS1PRSS2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 172 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20140283702-A1 | LITHOGRAPHIC PRINTING PLATE SUPPORT AND NEGATIVE PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE | MITSUBISHI PAPER MILLS LIMITED (JP) | 2014-09-25 | — | — | US | disclosed |
| US-8647813-B2 | Photosensitive composition and photosensitive lithographic printing plate material | MITSUBISHI PAPER MILLS LIMITED (JP) | 2014-02-11 | — | — | US | disclosed |
| US-20130022927-A1 | PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL | MITSUBISHI PAPER MILLS LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20130022927-A1 | PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL | MITSUBISHI PAPER MILLS LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-8241740-B2 | Layer laminated to support; ionization radiation; curing using free radical catalyst; image display and polarization plates | FUJIFILM CORPORATION (JP) | 2012-08-14 | — | — | US | disclosed |
| US-8088552-B2 | Photosensitive composition and lithographic printing original plate using the composition | OKAMOTO CHEMICAL INDUSTRY CO., LTD. (JP) | 2012-01-03 | — | — | US | disclosed |
| US-8088552-B2 | Photosensitive composition and lithographic printing original plate using the composition | OKAMOTO CHEMICAL INDUSTRY CO., LTD. (JP) | 2012-01-03 | — | — | US | disclosed |
| US-20110318689-A1 | LIGHT-SENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL | MITSUBISHI PAPER MILLS LIMITED (JP) | 2011-12-29 | — | — | US | disclosed |
| US-20110318689-A1 | LIGHT-SENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL | MITSUBISHI PAPER MILLS LIMITED (JP) | 2011-12-29 | — | — | US | disclosed |
| US-20100112478-A1 | WATER-DEVELOPABLE PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL | MITSUBISHI PAPER MILLS LIMITED (JP) | 2010-05-06 | — | — | US | disclosed |
| EP-1300726-A1 | Photothermographic material comprising fragmentable electron donor | FUJI PHOTO FILM CO., LTD. (JP) | 2003-04-09 | — | — | EP | disclosed |
| EP-1300725-A2 | Method of producing thermal-developable photosensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 2003-04-09 | — | — | EP | disclosed |
| US-20020177090-A1 | Photothermographic material | FUJIFILM CORPORATION (JP) | 2002-11-28 | — | — | US | disclosed |
| US-20020102502-A1 | Thermal development photosensitive material | FUJIFILM CORPORATION (JP) | 2002-08-01 | — | — | US | disclosed |
| US-20020086251-A1 | Photothermographic material | FUJIFILM CORPORATION (JP) | 2002-07-04 | — | — | US | disclosed |
| EP-1220026-A1 | Heat-developable image recording material | FUJI PHOTO FILM CO., LTD. (JP) | 2002-07-03 | — | — | EP | disclosed |
| US-6413705-B1 | UNDERCOAT LAYER COMPRISES A POLYESTER RESINS CONTAINING AT LEAST TWO KINDS OF WATER-SOLUBLE AND WATER DISPERSIBLE POLYESTER RESINS, EACH OF WHICH HAS DIFFERENT GLASS TRANSITION TEMPERATURE; ONE ISOPHTHALIC ACID WITH SULFONATE | FUJI PHOTO FILM CO., LTD. (JP) | 2002-07-02 | — | — | US | disclosed |
| US-20020076663-A1 | HEAT-DEVELOPABLE RECORDING MATERIAL | FUJIFILM CORPORATION (JP) | 2002-06-20 | — | — | US | disclosed |
| US-20020048732-A1 | Photothermographic material and method for forming images | FUJIFILM CORPORATION (JP) | 2002-04-25 | — | — | US | disclosed |
| US-6376166-B1 | PHOTOSENSITIVE SILVER HALIDE, REDUCABLE SILVER SALT AND PHENOL COMPOUND | FUJI PHOTO FILM CO., LTD. (JP) | 2002-04-23 | — | — | US | disclosed |