Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HPGD | P15428 | 1/20 | 0.51 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.49 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.49 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.49 |
| ▸ | RAB9A | P51151 | 1/20 | 0.49 |
| ▸ | SIGMAR1 | Q99720 | 4/20 | 0.47 |
| ▸ | GRIN2D | O15399 | 1/20 | 0.46 |
| ▸ | GRIN3B | O60391 | 1/20 | 0.46 |
| ▸ | GRIN1 | Q05586 | 1/20 | 0.46 |
| ▸ | GRIN2A | Q12879 | 1/20 | 0.46 |
| ▸ | GRIN2B | Q13224 | 1/20 | 0.46 |
| ▸ | GRIN2C | Q14957 | 1/20 | 0.46 |
| ▸ | GRIN3A | Q8TCU5 | 1/20 | 0.46 |
| ▸ | POLB | P06746 | 1/20 | 0.46 |
| ▸ | MEN1 | O00255 | 3/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.46 |
| ▸ | RECQL | P46063 | 1/20 | 0.46 |
| ▸ | THRB | P10828 | 1/20 | 0.46 |
| ▸ | TSHR | P16473 | 1/20 | 0.46 |
| ▸ | ATM | Q13315 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5621854 | 0.89 | SMN1; SMN2 (0.58) | HPGDEPHX2EPHX1SMN1; SMN2RAB9A | |
| SCHEMBL5621851 | 0.89 | SMN1; SMN2 (0.58) | HPGDEPHX2EPHX1SMN1; SMN2RAB9A | |
| SCHEMBL9616080 | 0.87 | SIGMAR1 (0.59) | HPGDEPHX2EPHX1SMN1; SMN2RAB9A | |
| SCHEMBL9616079 | 0.87 | SIGMAR1 (0.59) | HPGDEPHX2EPHX1SMN1; SMN2RAB9A | |
| SCHEMBL10578992 | 0.86 | P2RX7 (0.52) | HPGDEPHX2EPHX1SMN1; SMN2RAB9A | |
| SCHEMBL11157651 | 0.83 | NPC1 (0.53) | HPGDSMN1; SMN2RAB9AMEN1KMT2A | |
| SCHEMBL10493671 | 0.82 | NPC1 (0.51) | HPGDEPHX1SMN1; SMN2RAB9ASIGMAR1 | |
| SCHEMBL8741848 | 0.78 | RAB9A (0.55) | HPGDEPHX2EPHX1SMN1; SMN2RAB9A | |
| SCHEMBL10493613 | 0.77 | EPHX1 (0.63) | EPHX2EPHX1SMN1; SMN2RAB9AMEN1 | |
| SCHEMBL10493615 | 0.77 | EPHX1 (0.63) | EPHX2EPHX1SMN1; SMN2RAB9AMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9500951-B2 | Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2016-11-22 | — | — | US | disclosed |
| US-9500951-B2 | Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2016-11-22 | — | — | US | disclosed |
| US-9459531-B2 | — | — | 2016-10-04 | — | — | US | disclosed |
| US-9459531-B2 | — | — | 2016-10-04 | — | — | US | disclosed |
| US-9323150-B2 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern | FUJIFILM CORPORATION (JP) | 2016-04-26 | — | — | US | disclosed |
| US-9323150-B2 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern | FUJIFILM CORPORATION (JP) | 2016-04-26 | — | — | US | disclosed |
| US-9188865-B2 | Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2015-11-17 | — | — | US | disclosed |
| US-9188865-B2 | Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2015-11-17 | — | — | US | disclosed |
| US-9188862-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same | FUJIFILM CORPORATION (JP) | 2015-11-17 | — | — | US | disclosed |
| US-9188862-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same | FUJIFILM CORPORATION (JP) | 2015-11-17 | — | — | US | disclosed |
| EP-1630212-B1 | Ink composition and inkjet recording method | FUJIFILM CORP (JP) | 2008-10-22 | — | — | EP | disclosed |
| US-7291213-B2 | Ink composition and inkjet recording method | FUJIFILM CORPORATION (JP) | 2007-11-06 | — | — | US | disclosed |
| US-7291213-B2 | Ink composition and inkjet recording method | FUJIFILM CORPORATION (JP) | 2007-11-06 | — | — | US | disclosed |
| US-5641724-A | AN ELECTRON DONATING CHROMOPHORIC AMINOFLUORAN COMPOUND, AN ELECTRON ACCEPTING COMPOUND AS DEVELOPER IS SELECTED FROM ORGAINC PHOSPHONIC ACID COMPOUNDS, ALIPHATIC CARBOXYLIC COMPOUNDS, A PHENOL COMPOUNDS, ALSO CONTAIN GUANIDINES | RICOH COMPANY, LTD. (JP) | 1997-06-24 | — | — | US | disclosed |
| US-5403810-A | Reversible thermosensitive coloring composition and reversible thermosensitive recording medium using the same | RICOH COMPANY, LTD. (JP) | 1995-04-04 | — | — | US | disclosed |
| EP-0337734-B1 | Heat-developable diazo copying material | FUJI PHOTO FILM CO LTD (JP) | 1995-03-08 | — | — | EP | disclosed |
| US-5236800-A | Support; diazo compound; no solvnet; coupling component; basic substance; shelf life | FUJI PHOTO FILM CO., LTD. (JP) | 1993-08-17 | — | — | US | disclosed |
| EP-0337734-A2 | Heat-developable diazo copying material | FUJI PHOTO FILM CO., LTD. (JP) | 1989-10-18 | — | — | EP | disclosed |
| US-4828957-A | Two-color heat-sensitive recording material with 2-hydroxy-3-naphthoanilide as both coupler and color developing agent | KANZAKI PAPER MANUFACTURING COMPANY, LTD. (JP) | 1989-05-09 | — | — | US | disclosed |
| US-4387150-A | HYDROPHOBIC GUANIDINE COMPOUND AS DEVELOPER | MITSUBISHI PAPER MILLS, LTD. (JP) | 1983-06-07 | — | — | US | disclosed |