Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | PABPC1 | P11940 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12667575 | 0.87 | MEN1 (0.39) | MEN1PABPC1KMT2A | |
| SCHEMBL12418939 | 0.86 | L3MBTL1 (0.33) | L3MBTL1 | |
| SCHEMBL75394 | 0.82 | L3MBTL1 (0.43) | L3MBTL1LMNA | |
| SCHEMBL16359990 | 0.79 | — | — | |
| SCHEMBL36462 | 0.78 | L3MBTL1 (0.35) | L3MBTL1 | |
| SCHEMBL36050 | 0.78 | L3MBTL1 (0.31) | L3MBTL1 | |
| SCHEMBL5527137 | 0.76 | L3MBTL1 (0.30) | L3MBTL1 | |
| SCHEMBL19959610 | 0.76 | L3MBTL1 (0.36) | L3MBTL1 | |
| SCHEMBL10056666 | 0.75 | L3MBTL1 (0.57) | L3MBTL1LMNA | |
| SCHEMBL17813442 | 0.75 | L3MBTL1 (0.57) | L3MBTL1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9625813-B2 | Chemical amplification resist composition, resist film using the composition, resist-coated mask blanks, resist pattern forming method, photomask and polymer compound | FUJIFILM CORPORATION (JP) | 2017-04-18 | — | — | US | disclosed |
| WO-2016120944-A1 | ADHESION LAYER-FORMING COMPOSITION, METHOD OF MANUFACTURING CURED PRODUCT PATTERN, METHOD OF MANUFACTURING OPTICAL COMPONENT, METHOD OF MANUFACTURING CIRCUIT BOARD, METHOD OF MANUFACTURING IMPRINTING MOLD, AND DEVICE COMPONENT | CANON KABUSHIKI KAISHA (JP) | 2016-08-04 | — | — | WO | disclosed |
| US-9223208-B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition | FUJIFILM CORPORATION (JP) | 2015-12-29 | — | — | US | disclosed |
| US-20150338736-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2015-11-26 | — | — | US | disclosed |
| US-9152047-B2 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray-or radiation-sensitive film therefrom, method of forming pattern, process for manufacturing semiconductor device, semiconductor device and compound | FUJIFILM CORPORATION (JP) | 2015-10-06 | — | — | US | disclosed |
| US-9069246-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method and resist film using the composition, and electronic device manufacturing method and electronic device using these | FUJIFILM CORPORATION (JP) | 2015-06-30 | — | — | US | disclosed |
| US-8962233-B2 | Actinic-ray—or radiation-sensitive resin composition and method of forming pattern using the composition | FUJIFILM CORPORATION (JP) | 2015-02-24 | — | — | US | disclosed |
| US-8940471-B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition | FUJIFILM CORPORATION (JP) | 2015-01-27 | — | — | US | disclosed |
| US-8900791-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition | FUJIFILM CORPORATION (JP) | 2014-12-02 | — | — | US | disclosed |
| US-20140349223-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN, PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE AND COMPOUND | FUJIFILM CORPORATION (JP) | 2014-11-27 | — | — | US | disclosed |
| US-20120214091-A1 | RESIST FILM, RESIST COATED MASK BLANKS AND METHOD OF FORMING RESIST PATTERN USING THE RESIST FILM, AND CHEMICAL AMPLIFICATION TYPE RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-08-23 | — | — | US | disclosed |
| US-20120003583-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-01-05 | — | — | US | disclosed |
| US-20110318691-A1 | RESIST COMPOSITION FOR SEMICONDUCTOR, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-12-29 | — | — | US | disclosed |
| US-20110189609-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-08-04 | — | — | US | disclosed |
| US-20110171577-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN WITH THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-07-14 | — | — | US | disclosed |
| US-20110076615-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-03-31 | — | — | US | disclosed |
| US-20100297851-A1 | COMPOSITIONS AND METHODS FOR MULTIPLE EXPOSURE PHOTOLITHOGRAPHY | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2010-11-25 | — | — | US | disclosed |
| US-20100297851-A1 | COMPOSITIONS AND METHODS FOR MULTIPLE EXPOSURE PHOTOLITHOGRAPHY | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2010-11-25 | — | — | US | disclosed |
| US-20100159217-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERNS, AND ELECTRONIC PARTS | HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD (JP) | 2010-06-24 | — | — | US | disclosed |
| US-20090181224-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD AND ELECTRONIC PARTS | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2009-07-16 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20150338736-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN | AFF1, MACF1, RER1 | L3MBTL1 2772/4885MEN1 435/4885PABPC1 3613/4885 |
| US-20110318691-A1 | RESIST COMPOSITION FOR SEMICONDUCTOR, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME | RIF1, MSI2, SLIRP | L3MBTL1 4158/4885MEN1 737/4885PABPC1 552/4885 |
| US-20110171577-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN WITH THE COMPOSITION | ARSA, RAD51, ARID2 | L3MBTL1 3707/4885MEN1 2393/4885PABPC1 2635/4885 |
| US-20110189609-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | ARSA, RER1, TERB1 | L3MBTL1 2284/4885MEN1 4204/4885PABPC1 1830/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.