Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.49 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.35 |
| ▸ | MEN1 | O00255 | 2/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | ATM | Q13315 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | MIF | P14174 | 1/20 | 0.33 |
| ▸ | FKBP1A | P62942 | 1/20 | 0.33 |
| ▸ | SLC1A3 | P43003 | 2/20 | 0.33 |
| ▸ | SLC1A2 | P43004 | 2/20 | 0.33 |
| ▸ | SLC1A1 | P43005 | 2/20 | 0.33 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.31 |
| ▸ | PARP15 | Q460N3 | 1/20 | 0.31 |
| ▸ | PARP10 | Q53GL7 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2906290 | 0.74 | LMNA (0.50) | LMNAKMT2AMEN1MAPTATM | |
| SCHEMBL13345753 | 0.72 | LMNA (0.62) | LMNAKMT2AMEN1MAPTATM | |
| SCHEMBL8403203 | 0.72 | LMNA (0.61) | LMNAKMT2AMEN1SMN1; SMN2MIF | |
| SCHEMBL27437072 | 0.72 | GAA (0.44) | LMNAKMT2AMEN1MAPTSMN1; SMN2 | |
| SCHEMBL10263505 | 0.72 | LMNA (0.47) | LMNAKMT2AMEN1MAPTATM | |
| SCHEMBL27437017 | 0.72 | LMNA (0.53) | LMNAKMT2AMEN1MAPTATM | |
| SCHEMBL9208258 | 0.72 | LMNA (0.85) | LMNAKMT2AMEN1MAPTATM | |
| SCHEMBL4004096 | 0.72 | LMNA (0.66) | LMNAKMT2AMEN1MAPTATM | |
| SCHEMBL12131984 | 0.71 | LMNA (0.65) | LMNAKMT2AMEN1MAPTATM | |
| SCHEMBL10072658 | 0.70 | LMNA (0.58) | LMNAKMT2AMIFSLC1A3SLC1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12032290-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-09 | — | — | US | disclosed |