Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.61 |
| ▸ | SLC1A3 | P43003 | 3/20 | 0.40 |
| ▸ | SLC1A2 | P43004 | 3/20 | 0.40 |
| ▸ | SLC1A1 | P43005 | 3/20 | 0.40 |
| ▸ | MIF | P14174 | 1/20 | 0.39 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.38 |
| ▸ | PARP15 | Q460N3 | 1/20 | 0.38 |
| ▸ | PARP10 | Q53GL7 | 1/20 | 0.38 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.37 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.37 |
| ▸ | CHRM5 | P08912 | 1/20 | 0.37 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.37 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.37 |
| ▸ | NAAA | Q02083 | 2/20 | 0.37 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10072658 | 0.98 | LMNA (0.58) | LMNASLC1A3SLC1A2SLC1A1MIF | |
| SCHEMBL10072208 | 0.94 | LMNA (0.53) | LMNASLC1A3SLC1A2SLC1A1MIF | |
| SCHEMBL256681 | 0.89 | — | — | |
| SCHEMBL13878656 | 0.89 | LMNA (0.47) | LMNASLC1A3SLC1A2SLC1A1PARP15 | |
| Hydrochloric Acid SCHEMBL29367855 | 0.87 | LMNA (0.46) | LMNASLC1A3SLC1A2SLC1A1PARP15 | |
| SCHEMBL1058293 | 0.84 | LMNA (0.68) | LMNASLC1A3SLC1A2SLC1A1NAAA | |
| SCHEMBL4004096 | 0.83 | LMNA (0.66) | LMNASLC1A3SLC1A2SLC1A1MIF | |
| SCHEMBL9208258 | 0.83 | LMNA (0.85) | LMNASLC1A3SLC1A2SLC1A1MIF | |
| SCHEMBL12133169 | 0.82 | LMNA (0.71) | LMNAMEN1KMT2A | |
| SCHEMBL4962640 | 0.82 | LMNA (0.56) | LMNAMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110300791-A | Quantum dot dispersion, self-luminous photosensitive resin composition, color filter, and image display device | 东友精细化工有限公司 | 2019-10-01 | — | — | CN | claimed |
| CN-110300791-A | Quantum dot dispersion, self-luminous photosensitive resin composition, color filter, and image display device | 东友精细化工有限公司 | 2019-10-01 | — | — | CN | disclosed |
| CN-103387765-B | Photosensitive composition for solder resist printing ink or photoresist | INSIGHT HIGH TECHNOLOGY BEIJING CO LTD | 2014-12-24 | — | — | CN | disclosed |
| CN-103387765-A | Photosensitive composition for solder resist printing ink or photoresist | BEIJING INSIGHT HIGH TECHNOLOGY CO LTD | 2013-11-13 | — | — | CN | disclosed |
| US-8563219-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-10-22 | — | — | US | disclosed |
| US-8530137-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-09-10 | — | — | US | disclosed |
| US-8530137-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-09-10 | — | — | US | disclosed |
| US-20120219909-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-08-30 | — | — | US | disclosed |
| US-20110200935-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-08-18 | — | — | US | disclosed |
| US-20110200935-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-08-18 | — | — | US | disclosed |
| CN-102007118-A | Pyrrolidinone glucokinase activators | HOFFMANN LA ROCHE | 2011-04-06 | — | — | CN | disclosed |
| US-20110065047-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICHAL COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | disclosed |
| US-20070293530-A1 | SULFAMIDE AND SULFAMATE DERIVATIVES AS HISTONE DEACETYLASE INHIBITORS | METHYLGENE INC. (CA) | 2007-12-20 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110065047-A1 | PHOTORESIST COMPOSITION | C1R, C1S, RER1 | LMNA 3068/4885SLC1A3 1906/4885SLC1A2 2626/4885 |
| US-20110200935-A1 | PHOTORESIST COMPOSITION | C1R, F12, C1S | LMNA 2664/4885SLC1A3 1078/4885SLC1A2 894/4885 |
| US-20070293530-A1 | SULFAMIDE AND SULFAMATE DERIVATIVES AS HISTONE DEACETYLASE INHIBITORS | HDAC1, HDAC11, HAT1 | LMNA 2203/4885SLC1A3 3307/4885SLC1A2 2999/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.