Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.43 |
| ▸ | GRIN2D | O15399 | 5/20 | 0.42 |
| ▸ | GRIN3B | O60391 | 5/20 | 0.42 |
| ▸ | GRIN1 | Q05586 | 5/20 | 0.42 |
| ▸ | GRIN2A | Q12879 | 5/20 | 0.42 |
| ▸ | GRIN2B | Q13224 | 5/20 | 0.42 |
| ▸ | GRIN2C | Q14957 | 5/20 | 0.42 |
| ▸ | GRIN3A | Q8TCU5 | 5/20 | 0.42 |
| ▸ | LMNA | P02545 | 2/20 | 0.42 |
| ▸ | SLC22A2 | O15244 | 2/20 | 0.42 |
| ▸ | SLC47A1 | Q96FL8 | 2/20 | 0.42 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 1/20 | 0.42 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.42 |
| ▸ | STAT6 | P42226 | 1/20 | 0.42 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.42 |
| ▸ | POLB | P06746 | 1/20 | 0.40 |
| ▸ | THRB | P10828 | 1/20 | 0.40 |
| ▸ | BLM | P54132 | 1/20 | 0.40 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2502273 | 0.82 | ALDH1A1 (0.38) | ALDH1A1GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL10723906 | 0.73 | GRIN2D (0.38) | ALDH1A1GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL1199716 | 0.73 | GRIN2D (0.38) | ALDH1A1GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL131063 | 0.73 | GRIN2D (0.38) | ALDH1A1GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL2188644 | 0.73 | GRIN2D (0.38) | ALDH1A1GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL5550779 | 0.73 | GRIN2D (0.38) | ALDH1A1GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL6229823 | 0.73 | GRIN2D (0.39) | ALDH1A1GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL465574 | 0.73 | GRIN2D (0.38) | ALDH1A1GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL10011924 | 0.73 | GRIN2D (0.38) | ALDH1A1GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL17239705 | 0.72 | ALDH1A1 (0.44) | ALDH1A1GRIN2DGRIN3BGRIN1GRIN2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8337982-B2 | Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance | SUMITOMO BAKELITE CO., LTD. (JP) | 2012-12-25 | — | — | US | disclosed |
| EP-1752476-B1 | Insulating film formed by using a film-forming composition comprising a polymer and electronic device | FUJIFILM CORP (JP) | 2012-12-12 | — | — | EP | disclosed |
| US-8178631-B2 | Resin composition, varnish, resin film and semiconductor device | SUMITOMO BAKELITE COMPANY, LTD. (JP) | 2012-05-15 | — | — | US | disclosed |
| US-20090214860-A1 | Resin Composition, Varnish, Resin Film and Semiconductor Device | SUMITOMO BAKELITE COMPANY, LTD. (JP) | 2009-08-27 | — | — | US | disclosed |
| US-7514513-B2 | Polymer, film-forming composition comprising the polymer, insulating film formed by using the composition and electronic device | FUJIFILM CORPORATION (JP) | 2009-04-07 | — | — | US | disclosed |
| US-20080206548-A1 | Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device | SUMITOMO BAKELITE CO., LTD (JP) | 2008-08-28 | — | — | US | disclosed |
| EP-1953181-A1 | RESIN COMPOSITION, VARNISH, RESIN FILM AND SEMICONDUCTOR DEVICE | Sumitomo Bakelite Company, Ltd. (JP) | 2008-08-06 | — | — | EP | disclosed |
| EP-1832619-A1 | BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE | Sumitomo Bakelite Company, Limited (JP) | 2007-09-12 | — | — | EP | disclosed |
| US-20070037941-A1 | Polymer formed by polymerizing a mono- or dialkynylbiadamantane in the presence of a free radical catalyst; polymer can be dissolved in cyclohexanone to a concentration of 1 mass % or more at 25 degrees C. and formed into dielectric thin films | FUJI PHOTO FILM CO., LTD. | 2007-02-15 | — | — | US | disclosed |
| EP-1752476-A1 | Polymer, film-forming composition comprising the polymer, insulating film formed by using the composition and electronic device | Fuji Photo Film Co., Ltd. (JP) | 2007-02-14 | — | — | EP | disclosed |
| US-4918158-A | HEAT RESISTANCE; DIELECTRICS, MATRICES, AEROSPACE | FLUOROCHEM INC. (US) | 1990-04-17 | — | — | US | disclosed |
| US-4849565-A | 1,3-diethynyladamantane and methods of polymerization thereof | BAUM KURT (US) | 1989-07-18 | — | — | US | disclosed |