SCHEMBL2746792

SCHEMBL2746792

O=C(O)c1ccc(Oc2cccc(Oc3ccc(C(=O)O)cc3)c2C#CC23CC4CC(CC(C4)C2)C3)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SRD5A2 P31213 4/20 0.40
RXRA P19793 1/20 0.39
EPHX2 P34913 5/20 0.38
KDM4E B2RXH2 2/20 0.38
MMP13 P45452 1/20 0.38
HPGD P15428 1/20 0.38
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
PARP15 Q460N3 1/20 0.37
PARP10 Q53GL7 1/20 0.37
LPAR1 Q92633 2/20 0.36
LPAR5 Q9H1C0 2/20 0.36
NR1I2 O75469 1/20 0.36
LMNA P02545 1/20 0.36
PGR P06401 1/20 0.36
RARA P10276 1/20 0.36
HSPD1 P10809 1/20 0.36
RARB P10826 1/20 0.36
RARG P13631 1/20 0.36
GOT1 P17174 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2746793 0.80 MMP13 (0.46) SRD5A2RXRAEPHX2KDM4EMMP13
SCHEMBL2746654 0.80 MEN1 (0.42) RXRAEPHX2KDM4EHPGDMEN1
SCHEMBL2748136 0.77 KDM4E (0.38) EPHX2KDM4EMEN1KMT2ALPAR1
SCHEMBL2710679 0.76 KDM4E (0.44) EPHX2KDM4EHPGDMEN1KMT2A
Hydrochloric Acid SCHEMBL5000607 0.74 KDM4E (0.43) EPHX2KDM4EHPGDMEN1KMT2A
SCHEMBL4640992 0.72 AKR1C3 (0.43) EPHX2MEN1KMT2A
SCHEMBL2747221 0.72 KDM4E (0.44) SRD5A2EPHX2KDM4EMEN1KMT2A
SCHEMBL28253414 0.72 LPAR1 (0.52) SRD5A2KDM4EHPGDPARP15PARP10
SCHEMBL2709593 0.71 RARB (0.55) SRD5A2RXRAKDM4EHPGDMEN1
SCHEMBL2747022 0.71 SRD5A2 (0.43) SRD5A2RXRAKDM4EHPGDMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
US-8178631-B2 Resin composition, varnish, resin film and semiconductor device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2012-05-15 US disclosed
US-20090214860-A1 Resin Composition, Varnish, Resin Film and Semiconductor Device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2009-08-27 US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed
EP-1953181-A1 RESIN COMPOSITION, VARNISH, RESIN FILM AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Ltd. (JP) 2008-08-06 EP disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 EP disclosed