SCHEMBL4640992

SCHEMBL4640992

O=C(O)c1cc(Oc2cccc(C#CC34CC5CC(CC(C5)C3)C4)c2)cc(C(=O)O)c1

nearest known ligand 0.43

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
AKR1C3 P42330 1/20 0.43
EPHX2 P34913 2/20 0.41
HAO1 Q9UJM8 11/20 0.40
ALOX5 P09917 1/20 0.38
KMT2A Q03164 2/20 0.38
MEN1 O00255 1/20 0.38
FAAH O00519 1/20 0.38
CNR2 P34972 1/20 0.38
KMO O15229 1/20 0.38
GRM5 P41594 1/20 0.38
ATM Q13315 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2746793 0.82 MMP13 (0.46) EPHX2KMT2AMEN1
SCHEMBL2708596 0.79 MEN1 (0.36) EPHX2KMT2AMEN1FAAHCNR2
SCHEMBL2748136 0.79 KDM4E (0.38) AKR1C3EPHX2KMT2AMEN1FAAH
SCHEMBL2746167 0.78 AKR1C3 (0.60) AKR1C3HAO1ALOX5KMO
Hydrochloric Acid SCHEMBL2706861 0.78 MEN1 (0.35) EPHX2KMT2AMEN1FAAHCNR2
SCHEMBL2708684 0.78 MEN1 (0.35) EPHX2KMT2AMEN1FAAHCNR2
SCHEMBL2746973 0.73 HAO1 (0.58) AKR1C3HAO1ALOX5KMT2AMEN1
SCHEMBL2746792 0.72 SRD5A2 (0.40) EPHX2KMT2AMEN1
SCHEMBL8511723 0.71 AKR1C3 (0.57) AKR1C3HAO1KMT2AMEN1KMO
SCHEMBL2710316 0.71 HNF4A (0.39) EPHX2FAAHGRM5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed
EP-1953181-A1 RESIN COMPOSITION, VARNISH, RESIN FILM AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Ltd. (JP) 2008-08-06 EP disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 EP disclosed