SCHEMBL2748136

SCHEMBL2748136

O=C(O)c1cc(Oc2ccccc2C#CC23CC4CC(CC(C4)C2)C3)cc(C(=O)O)c1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.38
LPAR1 Q92633 1/20 0.36
LPAR5 Q9H1C0 1/20 0.36
EZH2 Q15910 5/20 0.36
EPHX2 P34913 6/20 0.36
FAAH O00519 2/20 0.34
CNR2 P34972 1/20 0.34
MEN1 O00255 1/20 0.34
NR1I2 O75469 1/20 0.34
LMNA P02545 1/20 0.34
PGR P06401 1/20 0.34
RARA P10276 1/20 0.34
HSPD1 P10809 1/20 0.34
RARB P10826 1/20 0.34
RARG P13631 1/20 0.34
GOT1 P17174 1/20 0.34
GLRA1 P23415 1/20 0.34
BLM P54132 1/20 0.34
HSPE1 P61604 1/20 0.34
KMT2A Q03164 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2747221 0.83 KDM4E (0.44) KDM4EEZH2EPHX2MEN1NR1I2
SCHEMBL4640992 0.79 AKR1C3 (0.43) EPHX2FAAHCNR2MEN1KMT2A
SCHEMBL2746792 0.77 SRD5A2 (0.40) KDM4ELPAR1LPAR5EPHX2MEN1
SCHEMBL2746893 0.76 NPC1 (0.43) KDM4ELPAR1LPAR5MEN1KMT2A
SCHEMBL2708596 0.74 MEN1 (0.36) KDM4EEPHX2FAAHCNR2MEN1
SCHEMBL5667299 0.73 LPAR1 (0.44) LPAR1LPAR5EZH2MEN1KMT2A
Hydrochloric Acid SCHEMBL2706861 0.73 MEN1 (0.35) KDM4EEPHX2FAAHCNR2MEN1
SCHEMBL2708684 0.73 MEN1 (0.35) KDM4EEPHX2FAAHCNR2MEN1
SCHEMBL5667931 0.73 FFAR1 (0.41) LPAR1LPAR5LMNATDP1AKR1C3
SCHEMBL2746793 0.72 MMP13 (0.46) KDM4EEPHX2MEN1NR1I2LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
US-8178631-B2 Resin composition, varnish, resin film and semiconductor device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2012-05-15 US disclosed
US-20090214860-A1 Resin Composition, Varnish, Resin Film and Semiconductor Device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2009-08-27 US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed
EP-1953181-A1 RESIN COMPOSITION, VARNISH, RESIN FILM AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Ltd. (JP) 2008-08-06 EP disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 EP disclosed