SCHEMBL2747221

SCHEMBL2747221

O=C(O)c1ccc(C(=O)O)c(Oc2ccccc2C#CC23CC4CC(CC(C4)C2)C3)c1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.44
EZH2 Q15910 8/20 0.36
EPHX2 P34913 2/20 0.36
LMNA P02545 2/20 0.35
MEN1 O00255 1/20 0.35
NR1I2 O75469 1/20 0.35
PGR P06401 1/20 0.35
RARA P10276 1/20 0.35
HSPD1 P10809 1/20 0.35
RARB P10826 1/20 0.35
RARG P13631 1/20 0.35
GOT1 P17174 1/20 0.35
GLRA1 P23415 1/20 0.35
BLM P54132 1/20 0.35
HSPE1 P61604 1/20 0.35
KMT2A Q03164 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
RAB9A P51151 1/20 0.34
SRD5A2 P31213 1/20 0.34
STS P08842 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2748136 0.83 KDM4E (0.38) KDM4EEZH2EPHX2LMNAMEN1
SCHEMBL2709686 0.81 STS (0.40) KDM4EEPHX2LMNAMEN1NR1I2
SCHEMBL2706953 0.79 STS (0.40) KDM4EEPHX2LMNAMEN1NR1I2
SCHEMBL2747620 0.78 RAB9A (0.43) KDM4ELMNAMEN1KMT2ARAB9A
SCHEMBL2745853 0.75 KDM4E (0.43) KDM4EEZH2LMNABLMTDP1
SCHEMBL5667821 0.75 RXRA (0.41) KDM4ELMNATDP1RAB9ATTR
SCHEMBL29038528 0.72 HTT (0.59) KDM4ELMNABLMKMT2ATDP1
SCHEMBL2746792 0.72 SRD5A2 (0.40) KDM4EEPHX2LMNAMEN1NR1I2
SCHEMBL5667719 0.72 KMO (0.41) KDM4ELMNATDP1RAB9ATTR
SCHEMBL2708211 0.71 KDM4E (0.41) KDM4EEPHX2MEN1KMT2AHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
US-8178631-B2 Resin composition, varnish, resin film and semiconductor device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2012-05-15 US disclosed
US-20090214860-A1 Resin Composition, Varnish, Resin Film and Semiconductor Device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2009-08-27 US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed
EP-1953181-A1 RESIN COMPOSITION, VARNISH, RESIN FILM AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Ltd. (JP) 2008-08-06 EP disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 EP disclosed