SCHEMBL2747145

SCHEMBL2747145

C#Cc1c(C(=O)OC)cccc1C(=O)OC.c1cc2cc-2c1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.44
TSHR P16473 1/20 0.44
ALDH1A1 P00352 4/20 0.44
KMT2A Q03164 4/20 0.44
MAPT P10636 3/20 0.44
MEN1 O00255 3/20 0.44
HPGD P15428 2/20 0.44
GAA P10253 1/20 0.44
HSD17B10 Q99714 2/20 0.43
CFTR P13569 1/20 0.43
KDM4E B2RXH2 3/20 0.42
POLB P06746 1/20 0.42
ATM Q13315 1/20 0.42
SLC6A3 Q01959 4/20 0.42
SLC6A4 P31645 3/20 0.42
SLC6A2 P23975 1/20 0.42
NR4A2 P43354 2/20 0.41
NPSR1 Q6W5P4 1/20 0.40
RECQL P46063 1/20 0.39
TDP1 Q9NUW8 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1926587 0.84 LMNA (0.46) LMNATSHRALDH1A1KMT2AMAPT
SCHEMBL28583125 0.81 NR4A2 (0.46) LMNATSHRALDH1A1KMT2AMAPT
SCHEMBL1926846 0.80 ALDH1A1 (0.46) LMNATSHRALDH1A1KMT2AMAPT
SCHEMBL1926643 0.80 ALDH1A1 (0.40) LMNATSHRALDH1A1KMT2AMAPT
SCHEMBL16720410 0.80 SLC6A3 (0.42) LMNATSHRALDH1A1KMT2AMAPT
SCHEMBL16719439 0.80 SLC6A3 (0.41) LMNATSHRALDH1A1KMT2AMAPT
SCHEMBL28928571 0.80 KMT2A (0.48) LMNATSHRALDH1A1KMT2AMAPT
SCHEMBL1477041 0.79 TDP1 (0.45) ALDH1A1KMT2AMAPTMEN1HPGD
SCHEMBL2707738 0.79 ACMSD (0.49) TSHRALDH1A1KMT2AMEN1HPGD
Hydrochloric Acid SCHEMBL1477231 0.78 TDP1 (0.44) ALDH1A1KMT2AMAPTMEN1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
US-8178631-B2 Resin composition, varnish, resin film and semiconductor device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2012-05-15 US disclosed
US-20090214860-A1 Resin Composition, Varnish, Resin Film and Semiconductor Device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2009-08-27 US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed
EP-1953181-A1 RESIN COMPOSITION, VARNISH, RESIN FILM AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Ltd. (JP) 2008-08-06 EP disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 EP disclosed