SCHEMBL2747646

SCHEMBL2747646

Nc1cc(C23CC4CC(CC(C4)C2)C3)c(Oc2ccc(C34CC5CC(C3)CC(C36CC7CC(CC(c8ccc(Oc9cc(O)c(N)cc9C9%10CC%11CC(CC(C%11)C9)C%10)cc8)(C7)C3)C6)(C5)C4)cc2)cc1O

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.40
LMNA P02545 5/20 0.38
MEN1 O00255 4/20 0.38
KMT2A Q03164 4/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
POLB P06746 1/20 0.37
GAA P10253 1/20 0.37
GFER P55789 1/20 0.37
ESR1 P03372 1/20 0.37
RAB9A P51151 1/20 0.37
PGR P06401 1/20 0.35
SPHK2 Q9NRA0 2/20 0.33
SPHK1 Q9NYA1 2/20 0.33
GRIN2D O15399 1/20 0.33
GRIN3B O60391 1/20 0.33
GRIN1 Q05586 1/20 0.33
GRIN2A Q12879 1/20 0.33
GRIN2B Q13224 1/20 0.33
GRIN2C Q14957 1/20 0.33
GRIN3A Q8TCU5 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2747092 0.97 ALDH1A1 (0.39) ALDH1A1LMNAMEN1KMT2AL3MBTL1
SCHEMBL2747090 0.86 ALDH1A1 (0.33) ALDH1A1LMNAMEN1KMT2AL3MBTL1
SCHEMBL4991468 0.82 ALDH1A1 (0.44) ALDH1A1LMNAMEN1KMT2AL3MBTL1
SCHEMBL3185036 0.81 MMP2 (0.33) ALDH1A1MEN1KMT2AL3MBTL1POLB
SCHEMBL2708150 0.80 MEN1 (0.37) ALDH1A1LMNAMEN1KMT2AL3MBTL1
SCHEMBL3191103 0.78 MEN1 (0.39) ALDH1A1LMNAMEN1KMT2AL3MBTL1
SCHEMBL2747142 0.78 PTPN11 (0.32)
SCHEMBL2708132 0.78 MEN1 (0.38) ALDH1A1LMNAMEN1KMT2AL3MBTL1
SCHEMBL2747001 0.77 RARG (0.46) ALDH1A1LMNAMEN1KMT2APGR
SCHEMBL2710593 0.76 ESR1 (0.48) ALDH1A1LMNAMEN1KMT2AL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
US-8178631-B2 Resin composition, varnish, resin film and semiconductor device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2012-05-15 US disclosed
US-20090214860-A1 Resin Composition, Varnish, Resin Film and Semiconductor Device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2009-08-27 US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed
EP-1953181-A1 RESIN COMPOSITION, VARNISH, RESIN FILM AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Ltd. (JP) 2008-08-06 EP disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 EP disclosed