SCHEMBL275128

SCHEMBL275128

Cc1cc(C)c(C(=O)P(=O)(CC(C)C)C(=O)c2c(C)cc(C)cc2C)c(C)c1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.38
HPGD P15428 2/20 0.38
MEN1 O00255 2/20 0.38
SMN1; SMN2 Q16637 2/20 0.38
LMNA P02545 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38
MCOLN3 Q8TDD5 1/20 0.38
TAS1R3 Q7RTX0 5/20 0.36
TAS1R1 Q7RTX1 5/20 0.36
TAS1R2 Q8TE23 4/20 0.36
KDM4E B2RXH2 2/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
CYP1A2 P05177 1/20 0.35
CYP2C9 P11712 1/20 0.35
TSHR P16473 1/20 0.35
ALDH1A1 P00352 1/20 0.33
MAPT P10636 1/20 0.33
MAPK1 P28482 1/20 0.33
PGK1 P00558 1/20 0.32
PGK2 P07205 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14570826 0.94 HPGD (0.35) KMT2AHPGDMEN1SMN1; SMN2LMNA
SCHEMBL5995419 0.92 KMT2A (0.37) KMT2AHPGDMEN1SMN1; SMN2LMNA
SCHEMBL5997007 0.91 KDM4E (0.36) KMT2AHPGDMEN1SMN1; SMN2LMNA
SCHEMBL5995524 0.88 KMT2A (0.33) KMT2AHPGDMEN1SMN1; SMN2LMNA
SCHEMBL5995448 0.88 PKM (0.38) KMT2AMEN1SMN1; SMN2TAS1R3TAS1R1
SCHEMBL5995387 0.87 KMT2A (0.40) KMT2AHPGDMEN1SMN1; SMN2LMNA
SCHEMBL5994972 0.87 KMT2A (0.37) KMT2AHPGDMEN1SMN1; SMN2LMNA
SCHEMBL5994494 0.86 KMT2A (0.38) KMT2AHPGDMEN1SMN1; SMN2LMNA
SCHEMBL5994287 0.85 HMGCR (0.35) KMT2AHPGDMEN1CYP1A2CYP2C9
SCHEMBL5995481 0.85 CYP3A4 (0.38) KMT2AHPGDSMN1; SMN2MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 333 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2586804-A2 Photoradically and thermally radically curable composition KANEKA CORPORATION (JP) 2013-05-01 EP claimed
EP-0909288-B1 PROCESS FOR CURING A POLYMERIZABLE COMPOSITION CIBA SC HOLDING AG (CH) 2007-06-27 EP claimed
US-6676999-B2 HARDNESS OF THE CURED POLYURETHANE SURFACE COATING IS INCREASED BY MEANS OF IRRADIATION WITH UV LIGHT CIBA SPECIALTY CHEMICALS CORP. 2004-01-13 US claimed
US-20030203986-A1 Process for curing a polymerizable composition VALET ANDREAS (DE) 2003-10-30 US claimed
US-6620857-B2 Photopolymerization using photoinitiator; protective coatings CIBA SPECIALTY CHEMICALS CORPORATION 2003-09-16 US claimed
US-6316519-B1 CONTACTING MONOETHYLENICALLY UNSATURATED MONOMER WITH PHOTOINITIATOR; CONTACTING WITH ACTINIC RADIATION IN A PHOTOREACTOR, AND FORMING A LINEAR POLYMER OF CONTROLLED MOLECULAR WEIGHT E. I. DU PONT DE NEMOURS AND COMPANY 2001-11-13 US claimed
US-20010034379-A1 Process for curing a polymerizable composition VALET ANDREAS (DE) 2001-10-25 US claimed
EP-0909288-A1 PROCESS FOR CURING A POLYMERIZABLE COMPOSITION Ciba SC Holding AG (CH) 1999-04-21 EP claimed
WO-1998000456-A1 PROCESS FOR CURING A POLYMERIZABLE COMPOSITION CIBA SPECIALITY CHEMICALS HOLDING INC. (CH) 1998-01-08 WO claimed
JP-5345790-A None JP disclosed
WO-2026105802-A1 RESIN COMPOSITION, DRY FILM, AND CURED PRODUCT 太陽ホールディングス株式会社 2026-05-21 WO disclosed
US-12624140-B2 Composition containing compound having polyoxyalkylene chain RESONAC CORPORATION (JP) 2026-05-12 US disclosed
EP-4711396-A1 CURABLE COMPOSITION Tokyo University of Science (JP) 2026-03-18 EP disclosed
US-20260060900-A1 DENTAL COMPOSITE RESIN KIT SHOFU INC. (JP) 2026-03-05 US disclosed
WO-1998000456-A1 PROCESS FOR CURING A POLYMERIZABLE COMPOSITION CIBA SPECIALITY CHEMICALS HOLDING INC. (CH) 1998-01-08 WO disclosed
US-5616787-A REACTING THE CORRESPONDING AROMATIC HYDROCARBON WITH CARBON DIOXIDE CIBA-GEIGY CORPORATION (US) 1997-04-01 US disclosed
US-5534559-A UNSATURATED POLYESTERS CIBA-GEIGY CORPORATION (US) 1996-07-09 US disclosed
US-5472992-A For printing inks, surface coatings, photoresists CIBA-GEIGY CORPORATION (US) 1995-12-05 US disclosed
US-5399770-A Photoinitiator, preparation of printing plates, curing white paints CIBA-GEIGY CORPORATION (US) 1995-03-21 US disclosed
JP-H05345790-A ALKYLBISACYLPHOSPHINE OXIDE CIBA GEIGY AG 1993-12-27 JP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260060900-A1 DENTAL COMPOSITE RESIN KIT BOLA2; BOLA2B, LBR, COL2A1 KMT2A 939/4885HPGD 3210/4885MEN1 2022/4885
US-12624140-B2 Composition containing compound having polyoxyalkylene chain PIEZO1, HVCN1, TAF11 KMT2A 3677/4885HPGD 387/4885MEN1 4222/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.