Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NUDT1 | P36639 | 1/20 | 0.51 |
| ▸ | BACE1 | P56817 | 1/20 | 0.51 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.37 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.36 |
| ▸ | ABAT | P80404 | 1/20 | 0.36 |
| ▸ | BCL2 | P10415 | 1/20 | 0.36 |
| ▸ | BCL2L1 | Q07817 | 1/20 | 0.36 |
| ▸ | ESR1 | P03372 | 5/20 | 0.35 |
| ▸ | ESR2 | Q92731 | 4/20 | 0.35 |
| ▸ | NPC1 | O15118 | 1/20 | 0.35 |
| ▸ | RAB9A | P51151 | 1/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | MIF | P14174 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28113973 | 0.89 | NUDT1 (0.48) | NUDT1BACE1KEAP1HSP90AA1ABAT | |
| SCHEMBL27522139 | 0.88 | NUDT1 (0.53) | NUDT1BACE1HSP90AA1BCL2BCL2L1 | |
| SCHEMBL27615395 | 0.86 | NUDT1 (0.45) | NUDT1BACE1BCL2BCL2L1ESR1 | |
| SCHEMBL27513048 | 0.82 | NUDT1 (0.46) | NUDT1BACE1KEAP1HSP90AA1ESR1 | |
| SCHEMBL27870516 | 0.81 | NUDT1 (0.45) | NUDT1BACE1KEAP1HSP90AA1BCL2 | |
| Ethane SCHEMBL28119304 | 0.77 | NUDT1 (0.44) | NUDT1BACE1HSP90AA1ESR1ESR2 | |
| SCHEMBL27936312 | 0.77 | NUDT1 (0.63) | NUDT1BACE1HSP90AA1ESR1ESR2 | |
| SCHEMBL27584472 | 0.77 | NUDT1 (0.43) | NUDT1BACE1KEAP1HSP90AA1ESR1 | |
| SCHEMBL28269345 | 0.76 | NUDT1 (0.43) | NUDT1BACE1HSP90AA1ESR1ESR2 | |
| SCHEMBL27522228 | 0.76 | NUDT1 (0.48) | NUDT1BACE1HSP90AA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 79 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108693710-A | Positive photosensitive polysiloxane composition | 奇美实业股份有限公司 | 2018-10-23 | — | — | CN | disclosed |
| CN-107544209-A | Positive photosensitive resin composition and use thereof | 奇美实业股份有限公司 | 2018-01-05 | — | — | CN | disclosed |
| CN-107179652-A | Positive photosensitive polysiloxane composition and application thereof | 奇美实业股份有限公司 | 2017-09-19 | — | — | CN | disclosed |
| CN-103969952-B | New compound and its manufacture method, acid agent, anti-corrosion agent composition and Resist patterns forming method | 东京应化工业株式会社 | 2017-08-01 | — | — | CN | disclosed |
| CN-103885294-B | Photosensitive polysiloxane composition, protective film and element with protective film | 奇美实业股份有限公司 | 2017-07-14 | — | — | CN | disclosed |
| CN-106918989-A | Photosensitive polysiloxane composition, protective film and module with protective film | 奇美实业股份有限公司 | 2017-07-04 | — | — | CN | disclosed |
| CN-103901728-B | Photosensitive polysiloxane composition and application thereof | 奇美实业股份有限公司 | 2017-06-06 | — | — | CN | disclosed |
| CN-106338888-A | Photosensitive resin composition, protective film and element | 奇美实业股份有限公司 | 2017-01-18 | — | — | CN | disclosed |
| CN-103885289-B | Photosensitive resin composition, color filter and liquid crystal display element thereof | 奇美实业股份有限公司 | 2017-01-04 | — | — | CN | disclosed |
| CN-106154750-A | Photosensitive polysiloxane composition, protective film and element with protective film | 奇美实业股份有限公司 | 2016-11-23 | — | — | CN | disclosed |
| CN-101907827-B | Positive photosensitive resin composition and liquid crystal orientation control protrusion formed therefrom | CHI MEI IND CO LTD | 2011-11-23 | — | — | CN | disclosed |
| CN-101907827-A | Positive photosensitive resin composition and liquid crystal orientation control protrusion formed therefrom | CHI MEI IND CO LTD | 2010-12-08 | — | — | CN | disclosed |
| CN-1853140-B | Positive photoresist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO LTD | 2010-08-25 | — | — | CN | disclosed |
| CN-101470349-A | Resist composition, method for forming resist pattern, novel compound, and acid generator | TOKYO OHKA KOGYO CO LTD (JP) | 2009-07-01 | — | — | CN | disclosed |
| CN-101464628-A | Novel compound and method for producing same, acid generator, resist composition, and method for forming resist pattern | TOKYO OHKA KOGYO CO LTD (JP) | 2009-06-24 | — | — | CN | disclosed |
| CN-101408728-A | Resist composition, method of forming resist pattern, novel compound and method of producing the same | TOKYO OHKA KOGYO CO LTD (JP) | 2009-04-15 | — | — | CN | disclosed |
| CN-1289966-C | Positive photoetching gum composition and method for forming photoetching gum pattern using the same | TOKYO APPLIED CHEMICAL IND CO (JP) | 2006-12-13 | — | — | CN | disclosed |
| CN-1853140-A | Positive photoresist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO LTD (JP) | 2006-10-25 | — | — | CN | disclosed |
| CN-1591185-A | Positive photoetching gum composition and method for forming photoetching gum pattern using the same | TOKYO APPLIED CHEMICAL IND CO (JP) | 2005-03-09 | — | — | CN | disclosed |
| CN-1584742-A | Positive light sensitive resin composition | QIMEI IND CO LTD (CN) | 2005-02-23 | — | — | CN | disclosed |