Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NUDT1 | P36639 | 1/20 | 0.45 |
| ▸ | BACE1 | P56817 | 1/20 | 0.45 |
| ▸ | ENPP2 | Q13822 | 1/20 | 0.43 |
| ▸ | OPRM1 | P35372 | 9/20 | 0.40 |
| ▸ | OPRD1 | P41143 | 9/20 | 0.40 |
| ▸ | OPRK1 | P41145 | 9/20 | 0.40 |
| ▸ | DRD2 | P14416 | 1/20 | 0.38 |
| ▸ | DRD1 | P21728 | 1/20 | 0.38 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.38 |
| ▸ | DHFR | P00374 | 1/20 | 0.38 |
| ▸ | TLR8 | Q9NR97 | 1/20 | 0.37 |
| ▸ | BCL2 | P10415 | 1/20 | 0.36 |
| ▸ | BCL2L1 | Q07817 | 1/20 | 0.36 |
| ▸ | ESR1 | P03372 | 1/20 | 0.36 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.36 |
| ▸ | TYR | P14679 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27548577 | 0.86 | NUDT1 (0.51) | NUDT1BACE1BCL2BCL2L1ESR1 | |
| SCHEMBL27522139 | 0.85 | NUDT1 (0.53) | NUDT1BACE1DRD2DRD1TAAR1 | |
| SCHEMBL27498112 | 0.84 | OPRM1 (0.40) | NUDT1BACE1OPRM1OPRD1OPRK1 | |
| SCHEMBL27870516 | 0.81 | NUDT1 (0.45) | NUDT1BACE1OPRM1OPRD1OPRK1 | |
| SCHEMBL27602507 | 0.79 | NUDT1 (0.58) | NUDT1BACE1OPRM1OPRD1OPRK1 | |
| SCHEMBL27584497 | 0.78 | OPRM1 (0.44) | OPRM1OPRD1OPRK1DHFRTLR8 | |
| SCHEMBL28248490 | 0.76 | NUDT1 (0.40) | NUDT1BACE1ENPP2OPRM1OPRD1 | |
| SCHEMBL30893631 | 0.75 | OPRM1 (0.42) | NUDT1BACE1OPRM1OPRD1OPRK1 | |
| SCHEMBL29186093 | 0.75 | OPRM1 (0.42) | NUDT1BACE1OPRM1OPRD1OPRK1 | |
| SCHEMBL28113973 | 0.75 | NUDT1 (0.48) | NUDT1BACE1ESR1ESR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107870516-A | Positive photosensitive resin composition, patterned film and method for manufacturing bump | 奇美实业股份有限公司 | 2018-04-03 | — | — | CN | disclosed |
| CN-107561863-A | Positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2018-01-09 | — | — | CN | disclosed |
| CN-107179652-A | Positive photosensitive polysiloxane composition and application thereof | 奇美实业股份有限公司 | 2017-09-19 | — | — | CN | disclosed |
| CN-103885294-B | Photosensitive polysiloxane composition, protective film and element with protective film | 奇美实业股份有限公司 | 2017-07-14 | — | — | CN | disclosed |
| CN-106918989-A | Photosensitive polysiloxane composition, protective film and module with protective film | 奇美实业股份有限公司 | 2017-07-04 | — | — | CN | disclosed |
| CN-106918994-A | Photosensitive resin composition for black matrix and application thereof | 奇美实业股份有限公司 | 2017-07-04 | — | — | CN | disclosed |
| CN-106909028-A | Photosensitive resin composition, protective film and liquid crystal display element | 奇美实业股份有限公司 | 2017-06-30 | — | — | CN | disclosed |
| CN-106338888-A | Photosensitive resin composition, protective film and element | 奇美实业股份有限公司 | 2017-01-18 | — | — | CN | disclosed |
| CN-103728833-B | Photosensitive resin composition, protective film and element with protective film | 奇美实业股份有限公司 | 2017-01-04 | — | — | CN | disclosed |
| CN-103885289-B | Photosensitive resin composition, color filter and liquid crystal display element thereof | 奇美实业股份有限公司 | 2017-01-04 | — | — | CN | disclosed |
| CN-102841504-A | Positive photosensitive resin composition and method for forming pattern using the same | CHI MEI CORP | 2012-12-26 | — | — | CN | disclosed |
| CN-102778816-A | Positive photosensitive resin composition and method for forming pattern using the same | CHI MEI COOPERATION | 2012-11-14 | — | — | CN | disclosed |
| CN-102566273-A | Positive photosensitive resin composition and method for forming pattern | QIMEI IND CO LTD | 2012-07-11 | — | — | CN | disclosed |
| CN-102540727-A | Photo-curing polysiloxane composition and substrate protective film formed by same | CHI MEI CORP | 2012-07-04 | — | — | CN | disclosed |
| CN-102445852-A | Positive photosensitive resin composition and method for forming pattern | CHI MEI CORP | 2012-05-09 | — | — | CN | disclosed |
| CN-102443265-A | Photo-curing polysiloxane composition and substrate protective film formed by same | CHI MEI CORP | 2012-05-09 | — | — | CN | disclosed |
| CN-102346372-A | Positive photosensitive resin composition and method for forming pattern using the same | CHI MEI CORP | 2012-02-08 | — | — | CN | disclosed |
| CN-101907827-B | Positive photosensitive resin composition and liquid crystal orientation control protrusion formed therefrom | CHI MEI IND CO LTD | 2011-11-23 | — | — | CN | disclosed |
| CN-101907827-A | Positive photosensitive resin composition and liquid crystal orientation control protrusion formed therefrom | CHI MEI IND CO LTD | 2010-12-08 | — | — | CN | disclosed |
| CN-1584742-A | Positive light sensitive resin composition | QIMEI IND CO LTD (CN) | 2005-02-23 | — | — | CN | disclosed |