SCHEMBL27870516

SCHEMBL27870516

NCc1cc(O)c(C2CCCCC2)cc1Cc1ccccc1O

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ NUDT1 P36639 1/20 0.45
▸ BACE1 P56817 1/20 0.45
▸ HSPA5 P11021 1/20 0.43
▸ HSP90AA1 P07900 1/20 0.36
▸ TAAR1 Q96RJ0 1/20 0.36
▸ HRH3 Q9Y5N1 3/20 0.35
▸ KEAP1 Q14145 1/20 0.34
▸ HDAC4 P56524 1/20 0.33
▸ HDAC2 Q92769 1/20 0.33
▸ HDAC8 Q9BY41 1/20 0.33
▸ OPRM1 P35372 1/20 0.33
▸ OPRD1 P41143 1/20 0.33
▸ OPRK1 P41145 1/20 0.33
▸ OPRL1 P41146 1/20 0.33
▸ PTGDR2 Q9Y5Y4 1/20 0.33
▸ BCL2 P10415 1/20 0.33
▸ BCL2L1 Q07817 1/20 0.33
▸ ALDH1A1 P00352 1/20 0.32
▸ POLB P06746 1/20 0.32
▸ PABPC1 P11940 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27632291 0.86 HSPA5 (0.43) NUDT1BACE1HSPA5HSP90AA1HRH3
SCHEMBL27560096 0.82 HSPA5 (0.44) NUDT1BACE1HSPA5HSP90AA1HRH3
SCHEMBL27548577 0.81 NUDT1 (0.51) NUDT1BACE1HSP90AA1KEAP1BCL2
SCHEMBL27615395 0.81 NUDT1 (0.45) NUDT1BACE1TAAR1OPRM1OPRD1
SCHEMBL27522139 0.80 NUDT1 (0.53) NUDT1BACE1HSP90AA1TAAR1BCL2
SCHEMBL27632289 0.79 HSPA5 (0.41) NUDT1BACE1HSPA5HSP90AA1HRH3
SCHEMBL27602378 0.77 HSPA5 (0.44) NUDT1BACE1HSPA5HSP90AA1HRH3
SCHEMBL3270518 0.76 NUDT1 (0.58) NUDT1BACE1HSPA5HSP90AA1KEAP1
SCHEMBL27613254 0.76 HSPA5 (0.47) NUDT1BACE1HSPA5HSP90AA1HRH3
SCHEMBL27522228 0.76 NUDT1 (0.48) NUDT1BACE1HSP90AA1PABPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107561863-A Positive photosensitive resin composition and application thereof 奇美实业股份有限公司 2018-01-09 — — CN disclosed
CN-107544209-A Positive photosensitive resin composition and use thereof 奇美实业股份有限公司 2018-01-05 — — CN disclosed
CN-103885294-B Photosensitive polysiloxane composition, protective film and element with protective film 奇美实业股份有限公司 2017-07-14 — — CN disclosed
CN-103901728-B Photosensitive polysiloxane composition and application thereof 奇美实业股份有限公司 2017-06-06 — — CN disclosed
CN-106338888-A Photosensitive resin composition, protective film and element 奇美实业股份有限公司 2017-01-18 — — CN disclosed
CN-103698977-B Photosensitive resin composition, protective film and element with protective film 奇美实业股份有限公司 2017-01-04 — — CN disclosed
CN-103885289-B Photosensitive resin composition, color filter and liquid crystal display element thereof 奇美实业股份有限公司 2017-01-04 — — CN disclosed
CN-103728833-B Photosensitive resin composition, protective film and element with protective film 奇美实业股份有限公司 2017-01-04 — — CN disclosed
CN-106154750-A Photosensitive polysiloxane composition, protective film and element with protective film 奇美实业股份有限公司 2016-11-23 — — CN disclosed
CN-106054527-A Photosensitive resin composition and application thereof 奇美实业股份有限公司 2016-10-26 — — CN disclosed
CN-103424990-A Photocurable polysiloxane composition, protective film and element having protective film CHI MEI CORP 2013-12-04 — — CN disclosed
CN-103376661-A Photocurable polysiloxane composition, protective film and element having protective film CHI MEI COR 2013-10-30 — — CN disclosed
CN-103365093-A Photocurable polysiloxane composition, protective film and element having protective film CHI MEI CORP 2013-10-23 — — CN disclosed
CN-102540727-B Photo-curing polysiloxane composition and substrate protective film formed by same CHI MEI CORP 2013-08-14 — — CN disclosed
CN-103176364-A Positive photosensitive resin composition and use thereof CHI MEI CORP 2013-06-26 — — CN disclosed
CN-102443265-B Photo-curing polysiloxane composition and substrate protective film formed by same CHI MEI CORP 2013-06-05 — — CN disclosed
CN-103135355-A Photocurable polysiloxane composition, protective film and element having protective film CHI MEI CORP 2013-06-05 — — CN disclosed
CN-102841504-A Positive photosensitive resin composition and method for forming pattern using the same CHI MEI CORP 2012-12-26 — — CN disclosed
CN-102540727-A Photo-curing polysiloxane composition and substrate protective film formed by same CHI MEI CORP 2012-07-04 — — CN disclosed
CN-102443265-A Photo-curing polysiloxane composition and substrate protective film formed by same CHI MEI CORP 2012-05-09 — — CN disclosed
Send feedback