SCHEMBL27600528

SCHEMBL27600528

CCCCC(OCC)C(O)CC

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.37
CA2 P00918 5/20 0.35
CA1 P00915 3/20 0.35
LMNA P02545 2/20 0.35
MAPK1 P28482 1/20 0.34
PTPN1 P18031 1/20 0.34
SPHK1 Q9NYA1 2/20 0.33
TDP1 Q9NUW8 2/20 0.32
CYP3A4 P08684 3/20 0.32
TSHR P16473 3/20 0.32
ATM Q13315 1/20 0.32
CYP2D6 P10635 2/20 0.31
GMNN O75496 1/20 0.31
POLB P06746 1/20 0.31
THPO P40225 1/20 0.31
MTOR P42345 1/20 0.31
BLM P54132 1/20 0.31
KDM4E B2RXH2 1/20 0.31
TP53 P04637 1/20 0.31
CYP1A2 P05177 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6545145 0.80 LMNA (0.42) ALDH1A1CA2CA1LMNAMAPK1
SCHEMBL26257861 0.80 CA2 (0.41) ALDH1A1CA2CA1LMNAMAPK1
SCHEMBL21752766 0.79 LMNA (0.43) LMNATSHR
SCHEMBL114528 0.78 CYP2D6 (0.48) LMNAPTPN1SPHK1CYP3A4CYP2D6
SCHEMBL11709247 0.77 LMNA (0.50) ALDH1A1CA2CA1LMNAPTPN1
SCHEMBL10431670 0.75 ALDH1A1 (0.34) ALDH1A1CA2CA1MAPK1PTPN1
SCHEMBL28112527 0.75 TDP1 (0.43) ALDH1A1LMNAPTPN1SPHK1TDP1
SCHEMBL23525632 0.75 LMNA (0.46) ALDH1A1CA2CA1LMNATDP1
SCHEMBL5801443 0.75 MGAM (0.44) LMNATDP1TSHR
SCHEMBL3133594 0.74 SPHK1 (0.47) LMNAPTPN1SPHK1CYP3A4CYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-100432839-C Photoresist composite and image forming method using the same TOKYO APPLIED CHEMICAL INDUSTR (JP) 2008-11-12 CN disclosed
CN-1603953-A Photoresist composite and image forming method using the same TOKYO APPLIED CHEMICAL INDUSTR (JP) 2005-04-06 CN disclosed