SCHEMBL2769933

SCHEMBL2769933

CCCCO[SiH](OCCCC)c1ccccc1

nearest known ligand 0.47

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 2/20 0.47
TSHR P16473 5/20 0.44
TDP1 Q9NUW8 2/20 0.44
L3MBTL1 Q9Y468 2/20 0.44
CYP1A2 P05177 1/20 0.41
CYP2C9 P11712 1/20 0.41
CYP2C19 P33261 1/20 0.41
TP53 P04637 2/20 0.41
CYP3A4 P08684 2/20 0.40
MAPK1 P28482 2/20 0.40
ALDH1A1 P00352 2/20 0.40
PLA2G4B P0C869 2/20 0.40
HSD17B10 Q99714 1/20 0.39
PCSK9 Q8NBP7 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19809207 0.94 LTA4H (0.47) LTA4HTSHRTP53CYP3A4MAPK1
SCHEMBL1702519 0.92 TSHR (0.47) LTA4HTSHRTP53CYP3A4MAPK1
SCHEMBL28994570 0.90 LTA4H (0.43) LTA4HTSHRTDP1L3MBTL1CYP1A2
SCHEMBL705460 0.89 LTA4H (0.41) LTA4HTSHRTDP1L3MBTL1CYP1A2
SCHEMBL313696 0.87 LMNA (0.44) LTA4HTSHRTDP1L3MBTL1TP53
SCHEMBL15441673 0.85 LTA4H (0.43) LTA4HTSHRTP53CYP3A4MAPK1
SCHEMBL864473 0.83 LTA4H (0.47) LTA4HTSHRTDP1L3MBTL1CYP1A2
SCHEMBL705223 0.83 NR5A1 (0.44) LTA4HTSHRTP53CYP3A4MAPK1
SCHEMBL19809233 0.82 LMNA (0.40) LTA4HTSHRTDP1L3MBTL1TP53
SCHEMBL3481702 0.82 MEN1 (0.37) LTA4HTSHRTDP1L3MBTL1TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116710498-A Polyimide precursor resin composition and method for producing same 旭化成株式会社 2023-09-05 CN disclosed
US-9733397-B2 Anti-reflection coat and optical device TAMRON CO., LTD. (JP) 2017-08-15 US disclosed
CN-103185905-B Antireflection film and optical element TOTATSU CORP. (JP) 2015-12-23 CN disclosed
EP-2128897-B1 SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJITSU LTD (JP) 2015-05-06 EP disclosed
US-8791221-B2 Addition-curable metallosiloxane compound DAICEL CORPORATION (JP) 2014-07-29 US disclosed
US-8716209-B2 Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device FUJITSU LIMITED (JP) 2014-05-06 US disclosed
EP-2650319-A1 ADDITION-CURABLE METALLOSILOXANE COMPOUND Daicel Corporation (JP) 2013-10-16 EP disclosed
US-20130267653-A1 ADDITION-CURABLE METALLOSILOXANE COMPOUND DAICEL CORPORATION (JP) 2013-10-10 US disclosed
US-8546597-B2 Organic silane compound for forming Si-containing film by plasma CVD and method for forming Si-containing film SHIN-ETSU CHEMICAL CO., LTD (JP) 2013-10-01 US disclosed
CN-103249762-A Addition-curable metallosiloxane compound DAICEL CORP 2013-08-14 CN disclosed
US-20100280190-A1 CURABLE CAGE-TYPE SILICONE COPOLYMER AND PROCESS FOR PRODUCTION THEREOF AND CURABLE RESIN COMPOSITION COMPRISING CURABLE CAGE-TYPE SILICONE COPOLYMER AND CURED PRODUCT THEREOF NIPPON STEEL CHEMICAL & MATERIAL CO., LTD. (JP) 2010-11-04 US disclosed
EP-2194060-A1 Organic silane compounds for forming silicon-containing films by plasma CVD and method for forming silicon-containing films Shin-Etsu Chemical Co., Ltd. (JP) 2010-06-09 EP disclosed
US-20100137626-A1 ORGANIC SILANE COMPOUND FOR FORMING SI-CONTAINING FILM BY PLASMA CVD AND METHOD FOR FORMING SI-CONTAINING FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-06-03 US disclosed
US-20100007031-A1 AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2010-01-14 US disclosed
EP-2128897-A1 SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE Fujitsu Limited (JP) 2009-12-02 EP disclosed
EP-1070721-B1 Process for preparing epoxysilanes DEGUSSA (DE) 2003-05-07 EP disclosed
US-6402961-B1 HYDROSILATION OF SILANE AND ALLYL GLYCIDYL ETHER IN THE PRESENCE OF PLATINUM, PALLADIUM, RHENIUM, OR IRIDIUM TO FORM EPOXYSILANOLS WITHOUT CYCLIZATION DEGUSSA AG (DE) 2002-06-11 US disclosed
EP-1070721-A2 Process for preparing epoxysilanes Degussa-Hüls Aktiengesellschaft (DE) 2001-01-24 EP disclosed
EP-0070994-A1 Process for preparing 1,3-diene-homo or copolymers containing reactive silyl groups HÜLS AKTIENGESELLSCHAFT (DE) 1983-02-09 EP disclosed
US-4183844-A SILICON BOUND POLYBUTADIENE OIL CHEMISCHE WERKE HULS AKTIENGESELLSCHAFT (DE) 1980-01-15 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20130267653-A1 ADDITION-CURABLE METALLOSILOXANE COMPOUND B2M, MSI2, MNS1 LTA4H 3533/4885TSHR 4702/4885TDP1 4743/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.