SCHEMBL27729331

SCHEMBL27729331

CCCCOCN(OC)c1nc(N)nc(N)n1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.35
PKM P14618 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
NOS1 P29475 1/20 0.35
CDK1 P06493 2/20 0.33
CCNB1 P14635 2/20 0.33
CCNA2 P20248 2/20 0.33
CDK2 P24941 2/20 0.33
CCNA1 P78396 2/20 0.33
PIN1 Q13526 1/20 0.33
HRH2 P25021 1/20 0.32
HRH3 Q9Y5N1 1/20 0.32
HTT P42858 2/20 0.32
HSD17B10 Q99714 1/20 0.32
MCHR1 Q99705 1/20 0.31
CSNK1A1 P48729 1/20 0.31
CSNK1D P48730 1/20 0.31
PRKCD Q05655 1/20 0.31
PAK1 Q13153 1/20 0.31
CAMK2B Q13554 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4758768 0.81 LMNA (0.38) LMNAPKMSMN1; SMN2NOS1CDK1
SCHEMBL6720140 0.80 DHFR (0.34) LMNAPKMSMN1; SMN2NOS1CDK1
SCHEMBL2009963 0.79 LMNA (0.35) LMNAPKMSMN1; SMN2NOS1CDK1
SCHEMBL11126960 0.78 MAPT (0.39) LMNAPKMSMN1; SMN2NOS1CDK1
SCHEMBL9613748 0.77 LMNA (0.35) LMNAPKMSMN1; SMN2NOS1CDK1
Methoxymethane SCHEMBL6774591 0.77 TSHR (0.44) LMNAPKMNOS1CDK1CCNB1
SCHEMBL9769720 0.76 TSHR (0.48) LMNAPKMNOS1CDK1CCNB1
SCHEMBL8850504 0.76 LMNA (0.35) LMNAPKMSMN1; SMN2NOS1CDK1
SCHEMBL6716050 0.76 DHFR (0.34) LMNAPKMSMN1; SMN2NOS1CDK1
Formaldehyde SCHEMBL918417 0.76 LMNA (0.33) LMNAPKMSMN1; SMN2NOS1CDK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104870591-B Stratified material comprising polyester resin 3M创新有限公司 2018-05-08 CN disclosed
CN-103348267-A Film-forming material NISSAN CHEMICAL IND LTD 2013-10-09 CN disclosed
CN-103339533-A Film-forming material NISSAN CHEMICAL IND LTD 2013-10-02 CN disclosed
CN-102089711-B Positive photosensitive resin composition and polyhydroxyamide resin NISSAN CHEMICAL IND LTD 2013-05-22 CN disclosed
CN-102089711-A Positive photosensitive resin composition and polyhydroxyamide resin NISSAN CHEMICAL IND LTD 2011-06-08 CN disclosed
CN-101196697-A Photoreceptor overcoat layer masking agent XEROX CORP (US) 2008-06-11 CN disclosed