Fumaric Acid

Fumaric Acid

SCHEMBL2774698

C=CC(=O)OC(O)CC.O=C(O)C=CC(=O)O

nearest known ligand 0.42

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACEADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ATP4AATP4BAXLBTKCACNA1CCACNA1DCACNA1FCACNA1SCCR5CHRM2CHRM3CPT1BCPT2DPP4DRD1DRD2EGFRERBB2ERBB4FLT3HRH1HRH3HTR1AHTR2AHTR2BHTR2CHTR4JAK1JAK2JAK3KCNH2KMT2AMAP2K1MAP2K2MEN1MLNRMPLMTORPPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PLK4PPARGRENS1PR1SLC6A2SLC6A3SLC6A4SMOTYK2atpAatpBatpCatpDatpEatpFatpFHatpGpol

The experimentally established mechanism targets of Fumaric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
HCAR2 Q8TDS4 8/20 0.42
TSHR P16473 10/20 0.37
HPGD P15428 1/20 0.36
TP53 P04637 3/20 0.33
EGLN1 Q9GZT9 1/20 0.33
EGLN3 Q9H6Z9 1/20 0.33
LMNA P02545 1/20 0.32
ACHE P22303 1/20 0.32
BACE1 P56817 1/20 0.32
ALDH1A1 P00352 3/20 0.31
HIF1A Q16665 2/20 0.31
CYP3A4 P08684 1/20 0.31
HSD17B10 Q99714 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Maleic Acid SCHEMBL28398903 1.00 HCAR2 (0.42) HCAR2TSHRHPGDTP53EGLN1
Acrylic Acid SCHEMBL11758386 0.92 LMNA (0.40) HCAR2TSHRHPGDTP53LMNA
Hydrogen Peroxide SCHEMBL28304847 0.92 TSHR (0.42) HCAR2TSHRHPGDTP53LMNA
Crotonic Acid SCHEMBL28089693 0.91 HCAR2 (0.35) HCAR2TSHRHPGD
Crotonic Acid SCHEMBL27635749 0.91 HCAR2 (0.35) HCAR2TSHRHPGD
SCHEMBL29185573 0.91 HCAR2 (0.47) HCAR2TSHRHPGDACHEBACE1
SCHEMBL26116 0.90
SCHEMBL11193107 0.90
SCHEMBL28044771 0.90 HCAR2 (0.34) HCAR2TSHRHPGD
SCHEMBL28007379 0.90 HCAR2 (0.34) HCAR2TSHRHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110520794-B Polymerizable composition, photosensitive composition for black matrix, and photosensitive composition for black column spacer 株式会社艾迪科 2025-04-04 CN disclosed
WO-2025027985-A1 COMPOSITION, BLACK MATRIX, CURED PRODUCT, METHOD FOR PRODUCING CURED PRODUCT, AND DISPLAY DEVICE 株式会社ADEKA 2025-02-06 WO disclosed
CN-110546134-B Oxime ester compound and photopolymerization initiator containing the same 株式会社艾迪科 2024-12-20 CN disclosed
CN-110520796-B Polymerizable composition, photosensitive composition for black matrix, and photosensitive composition for black column spacer 株式会社艾迪科 2024-11-12 CN disclosed
WO-2024202696-A1 COMPOSITION, BLACK MATRIX, CURED PRODUCT, METHOD FOR PRODUCING CURED PRODUCT, AND DISPLAY DEVICE 株式会社ADEKA 2024-10-03 WO disclosed
CN-109476773-B Curable composition, cured product, and method for producing cured product 株式会社艾迪科 2022-05-13 CN disclosed
CN-106470971-B Novel polymerization initiator and radical polymerizable composition containing the same 株式会社艾迪科 2020-03-03 CN disclosed
CN-110546134-A Oxime ester compound and photopolymerization initiator containing the same ADEKA CORP 2019-12-06 CN disclosed
CN-109476773-A The manufacturing method of solidification compound, solidfied material and solidfied material 株式会社艾迪科 2019-03-15 CN disclosed
CN-108475019-A Black-colored photosensitive resin composition 株式会社艾迪科 2018-08-31 CN disclosed
EP-2175320-B1 ALKALI-DEVELOPABLE PHOTOSENSITIVE RESIN COMPOSITION ADEKA CORP (JP) 2013-03-13 EP disclosed
US-8338081-B2 Alkali-developable photosensitive resin composition and β-diketone compound ADEKA CORPORATION (JP) 2012-12-25 US disclosed
CN-101546122-B Color resist composition and a color filter using the same ADEKA CORP 2012-11-14 CN disclosed
US-20100129753-A1 ALKALI-DEVELOPABLE PHOTOSENSITIVE RESIN COMPOSITION AND BETA-DIKETONE COMPOUND ADEKA CORPORATION (JP) 2010-05-27 US disclosed
EP-2175320-A1 ALKALI-DEVELOPABLE PHOTOSENSITIVE RESIN COMPOSITION AND -DIKETONE COMPOUND Adeka Corporation (JP) 2010-04-14 EP disclosed
CN-101546122-A Color resist composition and a color filter using the same ASAHI DENKA CO LTD 2009-09-30 CN disclosed
EP-0872529-B2 BINDER FOR BUILDING STRUCTURES ASAHI CHEMICAL IND (JP) 2008-07-09 EP disclosed
EP-0872529-B1 BINDER FOR BUILDING STRUCTURES ASAHI CHEMICAL IND (JP) 2004-09-29 EP disclosed
US-6015845-A Binder for building structure ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 2000-01-18 US disclosed
EP-0872529-A1 BINDER FOR BUILDING STRUCTURES Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1998-10-21 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100129753-A1 ALKALI-DEVELOPABLE PHOTOSENSITIVE RESIN COMPOSITION AND BETA-DIKETONE COMPOUND RPS14, ACAD11, OR10J3 HCAR2 420/4885TSHR 3404/4885HPGD 2227/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.