Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GLA | P06280 | 2/20 | 0.44 |
| ▸ | CA12 | O43570 | 1/20 | 0.44 |
| ▸ | CA1 | P00915 | 1/20 | 0.44 |
| ▸ | CA2 | P00918 | 1/20 | 0.44 |
| ▸ | CA3 | P07451 | 1/20 | 0.44 |
| ▸ | CA4 | P22748 | 1/20 | 0.44 |
| ▸ | CA9 | Q16790 | 1/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.44 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.44 |
| ▸ | GABRA1 | P14867 | 3/20 | 0.41 |
| ▸ | GABRB2 | P47870 | 3/20 | 0.41 |
| ▸ | SRD5A1 | P18405 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 4/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.40 |
| ▸ | MAPT | P10636 | 3/20 | 0.40 |
| ▸ | POLB | P06746 | 1/20 | 0.40 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | XDH | P47989 | 1/20 | 0.38 |
| ▸ | ACHE | P22303 | 4/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL69556 | 0.89 | GABRA1 (0.48) | GLACA12CA1CA2CA3 | |
| Phenol SCHEMBL11595804 | 0.88 | GLA (0.37) | GLACA12CA1CA2CA3 | |
| SCHEMBL6690960 | 0.83 | GABRA1 (0.44) | GLACA1CA2TDP1GABRA1 | |
| 2-Allylphenol SCHEMBL11838946 | 0.80 | GABRA1 (0.50) | GLACA12CA1CA2CA3 | |
| 2-Allylphenol SCHEMBL3810253 | 0.80 | GABRA1 (0.50) | GLACA12CA1CA2CA3 | |
| SCHEMBL4987129 | 0.79 | ALDH1A1 (0.50) | GABRA1GABRB2SRD5A1MEN1KMT2A | |
| SCHEMBL10587406 | 0.79 | GABRA1 (0.53) | GLACA1CA2TDP1GABRA1 | |
| 2-Allylphenol SCHEMBL11595803 | 0.78 | GABRA1 (0.48) | GLACA12CA1CA2CA3 | |
| Metacresol SCHEMBL11209132 | 0.78 | ACHE (0.53) | TDP1SRD5A1MAPTMAPK1XDH | |
| SCHEMBL4931545 | 0.78 | GABRA1 (0.42) | GLACA1CA2TDP1GABRA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-102132212-B | Positive-type photosensitive resin composition, method for producing resist pattern, and electronic component | HITACHI CHEMICAL CO LTD | 2013-08-28 | — | — | CN | disclosed |
| CN-102257431-B | Positive photosensitive resin composition, method for producing resist pattern, semiconductor device, and electronic device | HITACHI CHEMICAL CO LTD | 2013-06-26 | — | — | CN | disclosed |
| CN-101855596-B | Positive-type photosensitive resin composition, method for production of resist pattern, semiconductor device, and electronic device | HITACHI CHEMICAL CO LTD | 2013-05-22 | — | — | CN | disclosed |
| CN-103091987-A | Positive-type photosensitive resin composition, method for producing resist pattern, semiconductor device, and electronic device | HITACHI CHEMICAL CO LTD | 2013-05-08 | — | — | CN | disclosed |
| CN-103097954-A | Positive photosensitive resin composition, method of creating resist pattern, and electronic component | HITACHI CHEMICAL CO LTD | 2013-05-08 | — | — | CN | disclosed |
| CN-102257431-A | Positive photosensitive resin composition, method for producing resist pattern, semiconductor device, and electronic device | HITACHI CHEMICAL CO LTD | 2011-11-23 | — | — | CN | disclosed |
| CN-102132212-A | Positive-type photosensitive resin composition, method for producing resist pattern, and electronic component | HITACHI CHEMICAL CO LTD | 2011-07-20 | — | — | CN | disclosed |
| CN-101855596-A | Positive-type photosensitive resin composition, method for production of resist pattern, semiconductor device, and electronic device | HITACHI CHEMICAL CO LTD | 2010-10-06 | — | — | CN | disclosed |