SCHEMBL278209

SCHEMBL278209

O=S(=O)(Nc1ccc(F)c([Ti](C2=CC=CC2)(C2=CC=CC2)c2c(F)ccc(NS(=O)(=O)C(F)(F)F)c2F)c1F)C(F)(F)F

nearest known ligand 0.39

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
CA2 P00918 5/20 0.39
CA1 P00915 1/20 0.39
PTGS1 P23219 7/20 0.32
PTGS2 P35354 7/20 0.32
PTPN11 Q06124 1/20 0.31
CYP2D6 P10635 1/20 0.30
CYP2C9 P11712 1/20 0.30
MAPK1 P28482 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL267063 0.86 KDM1A (0.33) PTGS2CYP2C9
SCHEMBL482859 0.84 PSIP1 (0.41) CYP2C9
SCHEMBL9865924 0.83 POLB (0.35)
SCHEMBL9800265 0.80 PTGS1 (0.34) CA2PTGS1PTGS2
SCHEMBL482890 0.80 KEAP1 (0.42) CA2CA1CYP2D6CYP2C9
SCHEMBL482909 0.79 CCR2 (0.38) CYP2D6CYP2C9
SCHEMBL269422 0.78 PDK1 (0.34)
SCHEMBL1405499 0.78
SCHEMBL482821 0.78 CYP3A4 (0.43) CYP2C9
SCHEMBL482914 0.78 CYP3A4 (0.43) CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 93 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3431544-B1 COMPOSITION FOR PREPARING A FOAM, FOAM, AND SHOE EMPLOYING THE SAME TSRC CORP (TW) 2025-02-26 EP disclosed
EP-3182204-B1 PLANOGRAPHIC PRINTING PLATE PRECURSOR USING A POLYMERIZABLE COMPOSITION FUJIFILM CORP (JP) 2021-10-20 EP disclosed
US-10780679-B2 Laminate, method for manufacturing laminate, semiconductor device, and method for manufacturing the semiconductor device FUJIFILM CORPORATION (JP) 2020-09-22 US disclosed
EP-3431544-A1 COMPOSITION FOR PREPARING A FOAM, FOAM, AND SHOE EMPLOYING THE SAME TSRC Corporation (TW) 2019-01-23 EP disclosed
US-20180222164-A1 LAMINATE, METHOD FOR MANUFACTURING LAMINATE, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING THE SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2018-08-09 US disclosed
EP-3182204-A1 PLANOGRAPHIC PRINTING PLATE PRECURSOR USING A POLYMERIZABLE COMPOSITION FUJIFILM Corporation (JP) 2017-06-21 EP disclosed
EP-2109000-B1 Polymer having polymerizable group, polymerizable composition, planographic printing plate precursor, and planographic printing method using the same FUJIFILM CORP (JP) 2017-02-22 EP disclosed
EP-2105795-B1 Resin composition for laser engraving, image forming material, relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate FUJIFILM CORP (JP) 2016-12-28 EP disclosed
EP-1887423-B1 Laser-decomposable resin composition and pattern-forming material using the same FUJIFILM CORP (JP) 2016-01-27 EP disclosed
EP-2085220-B1 Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method of producing the same FUJIFILM CORP (JP) 2015-05-20 EP disclosed
US-6727044-B1 LASER SCANNING LITHOGRAPHIC PRINTING ORIGINAL PLATE WHICH CAN PROVIDE A PRINTING PLATE HAVING A SUFFICIENTLY LONG PRESS LIFE EVEN BY HIGH-SPEED SCAN EXPOSURE AND CAUSES LITTLE FLUCTUATION IN THE PRINTING PERFORMANCE OF THE PRINTING PLATE FUJI PHOTO FILM CO., LTD. (JP) 2004-04-27 US disclosed
US-20040043325-A1 Polymerizable composition and negative-working planographic printing plate precursor using the same FUJI PHOTO FILM CO., LTD. 2004-03-04 US disclosed
EP-1391784-A2 Polymerizable composition and negative-working planographic printing plate precursor using the same FUJI PHOTO FILM CO., LTD. (JP) 2004-02-25 EP disclosed
US-20040009426-A1 Photopolymerizable monomers hardenable by an infrared exposure; electrostatic capacitance rate of increased ratio of such photosensitive formulation, is no more than 0.7 FUJI PHOTO FILM CO., LTD. 2004-01-15 US disclosed
EP-1369231-A2 Infrared photosensitive composition and image recording material for infrared exposure FUJI PHOTO FILM CO., LTD. (JP) 2003-12-10 EP disclosed
US-20030190554-A1 Photopolymerization; development using alkalinity developer FUJIFILM CORPORATION (JP) 2003-10-09 US disclosed
US-20030084806-A1 FINE PARTICLES CONTAINING A RADICAL POLYMERIZABLE ENCAPSULATED BY MICROCAPSULES FUJIFILM CORPORATION (JP) 2003-05-08 US disclosed
EP-1288720-A1 Plate-making method of printing plate FUJI PHOTO FILM CO., LTD. (JP) 2003-03-05 EP disclosed
EP-1249731-A2 Photosensitive composition and negative working lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2002-10-16 EP disclosed
EP-0949540-A1 Method for producing lithographic printing plate suitable for laser scan exposure, and photopolymerizable composition FUJI PHOTO FILM CO., LTD (JP) 1999-10-13 EP disclosed