Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.32 |
| ▸ | AKR1A1 | P14550 | 1/20 | 0.32 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.32 |
| ▸ | HTR2A | P28223 | 1/20 | 0.32 |
| ▸ | HTR2C | P28335 | 1/20 | 0.32 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.32 |
| ▸ | HRH1 | P35367 | 1/20 | 0.32 |
| ▸ | DRD3 | P35462 | 1/20 | 0.32 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.32 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.32 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | SLC1A3 | P43003 | 1/20 | 0.31 |
| ▸ | SLC1A2 | P43004 | 1/20 | 0.31 |
| ▸ | SLC1A1 | P43005 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8767889 | 0.78 | MAPT (0.38) | — | |
| SCHEMBL5067300 | 0.77 | CA2 (0.30) | CA2MAPK1CHRM1AKR1A1CHRM3 | |
| SCHEMBL654433 | 0.77 | CHRM1 (0.36) | CA2MAPK1CHRM1AKR1A1CHRM3 | |
| SCHEMBL9131322 | 0.76 | — | — | |
| SCHEMBL5404993 | 0.75 | CHRM1 (0.35) | CA2MAPK1CHRM1AKR1A1CHRM3 | |
| SCHEMBL5403967 | 0.75 | CHRM1 (0.35) | CA2MAPK1CHRM1AKR1A1CHRM3 | |
| SCHEMBL9065140 | 0.74 | — | — | |
| SCHEMBL1971029 | 0.71 | CA2 (0.32) | CA2MAPK1CHRM1AKR1A1CHRM3 | |
| SCHEMBL8467725 | 0.71 | — | — | |
| SCHEMBL28481634 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2133743-B1 | PHOTOSENSITIVE RESIN COMPOSITION, PROCESS FOR PRODUCING PATTERNED HARDENED FILM WITH USE THEREOF AND ELECTRONIC PART | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD (JP) | 2018-01-24 | — | — | EP | disclosed |
| US-8298747-B2 | Photosensitive resin composition, process for producing patterned hardened film with use thereof and electronic part | HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD. (JP) | 2012-10-30 | — | — | US | disclosed |
| US-20100092879-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PROCESS FOR PRODUCING PATTERNED HARDENED FILM WITH USE THEREOF AND ELECTRONIC PART | HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD. (JP) | 2010-04-15 | — | — | US | disclosed |
| EP-2133743-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PROCESS FOR PRODUCING PATTERNED HARDENED FILM WITH USE THEREOF AND ELECTRONIC PART | Hitachi Chemical DuPont Microsystems, Ltd. (JP) | 2009-12-16 | — | — | EP | disclosed |
| US-7488569-B2 | Negative resist composition, a method for forming a resist pattern thereof, and a method for fabricating a semiconductor device | FUJITSU LIMITED (JP) | 2009-02-10 | — | — | US | disclosed |
| EP-1889868-A1 | Polymer containing compositions | Wacker Chemie AG (DE) | 2008-02-20 | — | — | EP | disclosed |
| US-7144968-B2 | Silicon-containing polymer, process for its production, resist composition employing it, pattern-forming method and electronic device fabrication method | FUJITSU LIMITED (JP) | 2006-12-05 | — | — | US | disclosed |
| US-20060263723-A1 | Negative resist composition, a method for forming a resist pattern thereof, and a method for fabricating a semiconductor device | FUJITSU LIMITED (JP) | 2006-11-23 | — | — | US | disclosed |
| US-7122288-B2 | Negative resist composition, a method for forming a resist pattern thereof, and a method for fabricating a semiconductor device | FUJITSU LIMITED (JP) | 2006-10-17 | — | — | US | disclosed |
| US-20050038216-A1 | Silicon-containing polymer, process for its production, resist composition employing it, pattern-forming method and electronic device fabrication method | FUJITSU LIMITED | 2005-02-17 | — | — | US | disclosed |
| US-6770417-B2 | A NEGATIVE RESIST COMPOSITION COMPRISING A CONSTITUENT COMPONENT WHICH HAS A VINYL ETHER STRUCTURE PROTECTED WITH AN ACETAL IN A MOLECULE IS A FILM FORMING POLYMER SOLUBLE IN BASIC SOLUTION AND HAS AN ALKALI SOLUBLE GROUP | FUJITSU LIMITED (JP) | 2004-08-03 | — | — | US | disclosed |
| US-6709799-B2 | Resist compositions | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-03-23 | — | — | US | disclosed |
| US-6541077-B1 | Negative non-chemical amplification resist polymer or a positive chemical amplification resist polymer | FUJITSU LIMITED (JP) | 2003-04-01 | — | — | US | disclosed |
| US-20020177070-A1 | Negative resist composition, a method for forming a resist pattern thereof, and a method for fabricating a semiconductor device | FUJITSU LIMITED (JP) | 2002-11-28 | — | — | US | disclosed |
| US-20020120058-A1 | Silicon-containing polymer, process for its production, resist composition employing it, pattern-forming method and electronic device fabrication method | FUJITSU LIMITED | 2002-08-29 | — | — | US | disclosed |
| US-20020058197-A1 | Negative resist composition, process for forming resist patterns, and process for manufacturing electron device | FUJITSU LIMITED | 2002-05-16 | — | — | US | disclosed |
| EP-1184723-A2 | Negative resist composition, process for forming resist patterns, and process for manufacturing electronic device | FUJITSU LIMITED (JP) | 2002-03-06 | — | — | EP | disclosed |
| US-6342562-B1 | POLYSILICATE MODIFIED WITH ALKYLCARBOXY SILOXANE; AMPLIFICATION; PHOTORESIST | FUJITSU LIMITED (JP) | 2002-01-29 | — | — | US | disclosed |
| US-20010036594-A1 | Resist composition for use in chemical amplification and method for forming a resist pattern thereof | FUJITSU LIMITED (JP) | 2001-11-01 | — | — | US | disclosed |
| US-20010018161-A1 | Photosensitive resin for photolithography | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-30 | — | — | US | disclosed |