SCHEMBL278522

SCHEMBL278522

Oc1ccc(Cc2ccccc2)c(O)c1O

nearest known ligand 0.65

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
BCL2 P10415 1/20 0.59
BCL2L1 Q07817 1/20 0.59
ALOX5 P09917 1/20 0.57
MEN1 O00255 1/20 0.53
CYP3A4 P08684 1/20 0.53
HPGD P15428 1/20 0.53
ALOX15 P16050 1/20 0.53
KMT2A Q03164 1/20 0.53
HIF1A Q16665 1/20 0.53
HSD17B10 Q99714 1/20 0.53
ELANE P08246 2/20 0.50
IDH1 O75874 1/20 0.50
PAX8 Q06710 1/20 0.50
CTSG P08311 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29450504 1.00 BCL2 (0.59) BCL2BCL2L1ALOX5MEN1CYP3A4
SCHEMBL8430738 0.89 MAPT (0.45) BCL2BCL2L1MEN1KMT2A
SCHEMBL15313710 0.84 LTA4H (0.50) IDH1
SCHEMBL1644555 0.83 BCL2 (0.55) BCL2BCL2L1ALOX5MEN1CYP3A4
SCHEMBL18604564 0.83 BCL2 (0.55) BCL2BCL2L1ALOX5MEN1CYP3A4
SCHEMBL278269 0.83 KEAP1 (0.55) ALOX5MEN1KMT2A
SCHEMBL2944708 0.83 BCL2 (0.59) BCL2BCL2L1ALOX5MEN1CYP3A4
SCHEMBL29450506 0.83 KEAP1 (0.55) ALOX5MEN1KMT2A
SCHEMBL8430743 0.82 HSPA5 (0.54)
SCHEMBL11796747 0.82 BCL2 (0.53) BCL2BCL2L1ALOX5MEN1CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 194 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024128554-A1 METHOD FOR PREPARING CARBON DIOXIDE-EPOXIDE REACTION CATALYST, CARBON DIOXIDE-EPOXIDE REACTION CATALYST, AND POLYMER SYNTHESIS METHOD 아주대학교산학협력단 2024-06-20 WO claimed
WO-2023082337-A1 LIGHT DIFFUSION AGENT, FLAME-RETARDANT LIGHT DIFFUSION POLYCARBONATE COMPOSITION AND PREPARATION METHOD THEREFOR 聊城鲁西聚碳酸酯有限公司 2023-05-19 WO claimed
CN-113913008-B Light diffusant and flame-retardant light diffusion polycarbonate composition and preparation method thereof 聊城鲁西聚碳酸酯有限公司 2022-06-24 CN claimed
CN-114137795-A Photoresist composition and application thereof 广东粤港澳大湾区黄埔材料研究院 2022-03-04 CN claimed
CN-113913008-A Light diffusant and flame-retardant light diffusion polycarbonate composition and preparation method thereof 聊城鲁西聚碳酸酯有限公司 2022-01-11 CN claimed
US-4737437-A Light sensitive diazo compound, composition and method of making the composition EAST SHORE CHEMICAL CO. (US) 1988-04-12 US claimed
WO-1987006023-A1 4-BENZYL-PYROGALLOL, DIAZO-NAPHTHOQUINONE SULFONYL ESTER, PHOTORESIST, METHODS OF MAKING AFOREMENTIONED COMPOUNDS AND COMPOSITIONS EAST SHORE CHEMICAL COMPANY (US) 1987-10-08 WO claimed
JP-9002987-A None JP disclosed
JP-53130642-A None JP disclosed
US-20250340748-A1 Ultraviolet Light Stable Color-Changing Systems CHROMATIC TECHNOLOGIES, INC. (US) 2025-11-06 US disclosed
US-20250338852-A1 ANTIVIRAL COMPOSITION AND MEMBER HAVING SAME ON SURFACE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-11-06 US disclosed
US-20250318530-A1 ANTIVIRAL COMPOSITION AND MEMBER HAVING SAID COMPOSITION AT SURFACE THEREOF SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-10-16 US disclosed
US-12359083-B2 Ultraviolet light stable color-changing systems CHROMATIC TECHNOLOGIES, INC. (US) 2025-07-15 US disclosed
EP-0273026-A2 Solvents for Photoresist compositions SHIPLEY COMPANY INC. (US) 1988-06-29 EP disclosed
US-4737437-A Light sensitive diazo compound, composition and method of making the composition EAST SHORE CHEMICAL CO. (US) 1988-04-12 US disclosed
US-4737437-A Light sensitive diazo compound, composition and method of making the composition EAST SHORE CHEMICAL CO. (US) 1988-04-12 US disclosed
WO-1987006023-A1 4-BENZYL-PYROGALLOL, DIAZO-NAPHTHOQUINONE SULFONYL ESTER, PHOTORESIST, METHODS OF MAKING AFOREMENTIONED COMPOUNDS AND COMPOSITIONS EAST SHORE CHEMICAL COMPANY (US) 1987-10-08 WO disclosed
WO-1987006023-A1 4-BENZYL-PYROGALLOL, DIAZO-NAPHTHOQUINONE SULFONYL ESTER, PHOTORESIST, METHODS OF MAKING AFOREMENTIONED COMPOUNDS AND COMPOSITIONS EAST SHORE CHEMICAL COMPANY (US) 1987-10-08 WO disclosed
EP-0227487-A2 Positive type radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1987-07-01 EP disclosed
JP-S53130642-A NOVEL PYROGALLOL COMPOUND AND POLYMERIZATION OF VINYL CHLORIDE USING THE SAME KANEGAFUCHI CHEM IND CO LTD 1978-11-14 JP disclosed