Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTPN5 | P54829 | 4/20 | 0.44 |
| ▸ | PTPN2 | P17706 | 1/20 | 0.44 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.36 |
| ▸ | FEN1 | P39748 | 1/20 | 0.35 |
| ▸ | CDK5 | Q00535 | 1/20 | 0.34 |
| ▸ | CDK5R1 | Q15078 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | USP2 | O75604 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | PDE2A | O00408 | 1/20 | 0.33 |
| ▸ | PDE10A | Q9Y233 | 1/20 | 0.33 |
| ▸ | HSP90AA1 | P07900 | 2/20 | 0.33 |
| ▸ | HSP90AB1 | P08238 | 2/20 | 0.33 |
| ▸ | ESR1 | P03372 | 1/20 | 0.33 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27936382 | 0.83 | PTPN5 (0.46) | PTPN5PTPN2PTGS2FEN1 | |
| SCHEMBL21626185 | 0.83 | PTPN5 (0.52) | PTPN5PTPN2PTGS2FEN1MEN1 | |
| SCHEMBL5523047 | 0.81 | PTPN5 (0.45) | PTPN5PTPN2PTGS2FEN1MEN1 | |
| SCHEMBL5520332 | 0.81 | PTPN5 (0.45) | PTPN5PTPN2PTGS2FEN1 | |
| SCHEMBL5520487 | 0.77 | PTPN5 (0.44) | PTPN5PTPN2PTGS2FEN1HSP90AA1 | |
| SCHEMBL30218222 | 0.76 | ALDH1A1 (0.48) | PTPN5PTPN2FEN1 | |
| SCHEMBL8954630 | 0.76 | ALDH1A1 (0.48) | PTPN5PTPN2FEN1 | |
| SCHEMBL673222 | 0.76 | ALDH1A1 (0.48) | PTPN5PTPN2FEN1 | |
| SCHEMBL3143517 | 0.76 | OPRL1 (0.40) | HSP90AA1HSP90AB1ESR1ESR2 | |
| SCHEMBL9785240 | 0.76 | PTGDR2 (0.41) | MEN1MAPTKMT2AHSP90AA1HSP90AB1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103309152-A | Resist pattern formation method, pattern formation method, solar cell and positive resist composition | TOKYO OHKA KOGYO CO LTD | 2013-09-18 | — | — | CN | disclosed |