Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTPN5 | P54829 | 4/20 | 0.44 |
| ▸ | PTPN2 | P17706 | 1/20 | 0.44 |
| ▸ | ELANE | P08246 | 1/20 | 0.39 |
| ▸ | CTSG | P08311 | 1/20 | 0.39 |
| ▸ | FEN1 | P39748 | 4/20 | 0.38 |
| ▸ | NUDT1 | P36639 | 1/20 | 0.38 |
| ▸ | BACE1 | P56817 | 1/20 | 0.38 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.36 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.35 |
| ▸ | ALOX5AP | P20292 | 3/20 | 0.35 |
| ▸ | ADRA2A | P08913 | 2/20 | 0.34 |
| ▸ | ADRA2B | P18089 | 2/20 | 0.34 |
| ▸ | ADRA2C | P18825 | 2/20 | 0.34 |
| ▸ | HTR2C | P28335 | 2/20 | 0.34 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28807399 | 0.90 | PTPN5 (0.45) | PTPN5PTPN2ELANECTSGFEN1 | |
| SCHEMBL5523047 | 0.87 | PTPN5 (0.45) | PTPN5PTPN2ELANECTSGFEN1 | |
| SCHEMBL5520332 | 0.84 | PTPN5 (0.45) | PTPN5PTPN2ELANECTSGFEN1 | |
| SCHEMBL27936382 | 0.80 | PTPN5 (0.46) | PTPN5PTPN2FEN1PTGS2ALOX5AP | |
| SCHEMBL5527391 | 0.79 | NUDT1 (0.42) | PTPN5PTPN2FEN1NUDT1BACE1 | |
| SCHEMBL21626185 | 0.79 | PTPN5 (0.52) | PTPN5PTPN2FEN1NUDT1BACE1 | |
| SCHEMBL9136538 | 0.79 | NUDT1 (0.40) | PTPN5PTPN2FEN1NUDT1BACE1 | |
| SCHEMBL3787886 | 0.78 | NUDT1 (0.44) | PTPN5PTPN2FEN1NUDT1BACE1 | |
| SCHEMBL27936319 | 0.77 | PTPN5 (0.44) | PTPN5PTPN2FEN1PTGS2HSP90AA1 | |
| SCHEMBL8954630 | 0.76 | ALDH1A1 (0.48) | PTPN5PTPN2FEN1ALOX5APHTR2C |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115873214-A | Epoxy resin, photosensitive resin composition, resist film, curable composition, and cured film | DIC株式会社 | 2023-03-31 | — | — | CN | disclosed |
| CN-107703717-B | Positive photosensitive resin composition, method for producing metal wiring, and laminate | 东京应化工业株式会社 | 2023-01-24 | — | — | CN | disclosed |
| US-10577449-B2 | Phenolic-hydroxyl-group-containing novolac resin and resist film | DIC CORPORATION (JP) | 2020-03-03 | — | — | US | disclosed |
| US-9975830-B2 | Compound containing modified phenolic hydroxy group, method for producing compound containing modified phenolic hydroxy group, photosensitive composition, resist material, and resist coating film | DIC CORPORATION (JP) | 2018-05-22 | — | — | US | disclosed |
| US-20180134834-A1 | PHENOLIC-HYDROXYL-GROUP-CONTAINING NOVOLAC RESIN AND RESIST FILM | DIC CORPORATION (JP) | 2018-05-17 | — | — | US | disclosed |
| US-9963536-B2 | Phenolic hydroxyl group-containing resin, production method therefor, photosensitive composition, resist material, coating film, curable composition and cured product thereof, and resist underlayer film | DIC CORPORATION (JP) | 2018-05-08 | — | — | US | disclosed |
| US-9765175-B2 | Modified hydroxy naphthalene novolak resin, production method for modified hydroxy naphthalene novolak resin, photosensitive composition, resist material and coating | DIC CORPORATION (JP) | 2017-09-19 | — | — | US | disclosed |
| US-20170137556-A1 | PHENOLIC HYDROXYL GROUP-CONTAINING RESIN, PRODUCTION METHOD THEREFOR, PHOTOSENSITIVE COMPOSITION, RESIST MATERIAL, COATING FILM, CURABLE COMPOSITION AND CURED PRODUCT THEREOF, AND RESIST UNDERLAYER FILM | DIC CORPORATION (JP) | 2017-05-18 | — | — | US | disclosed |
| US-20170082923-A1 | PHOTOSENSITIVE COMPOSITION FOR PERMANENT FILMS, RESIST MATERIAL AND COATING FILM | DIC CORPORATION (JP) | 2017-03-23 | — | — | US | disclosed |
| US-20170066703-A1 | COMPOUND CONTAINING MODIFIED PHENOLIC HYDROXY GROUP, METHOD FOR PRODUCING COMPOUND CONTAINING MODIFIED PHENOLIC HYDROXY GROUP, PHOTOSENSITIVE COMPOSITION, RESIST MATERIAL, AND RESIST COATING FILM | DIC CORPORATION (JP) | 2017-03-09 | — | — | US | disclosed |
| US-20160177020-A1 | MODIFIED HYDROXY NAPHTHALENE NOVOLAK RESIN, PRODUCTION METHOD FOR MODIFIED HYDROXY NAPHTHALENE NOVOLAK RESIN, PHOTOSENSITIVE COMPOSITION, RESIST MATERIAL AND COATING | DIC CORPORATION (JP) | 2016-06-23 | — | — | US | disclosed |
| US-20070248905-A1 | TWO-LAYER FILM AND METHOD OF FORMING PATTERN WITH THE SAME | JSR CORPORATION (JP) | 2007-10-25 | — | — | US | disclosed |
| US-7247420-B2 | Two-layer film and method of forming pattern with the same | JSR CORPORATION (JP) | 2007-07-24 | — | — | US | disclosed |
| EP-1469353-A1 | TWO-LAYER FILM AND METHOD OF FORMING PATTERN WITH THE SAME | JSR Corporation (JP) | 2004-10-20 | — | — | EP | disclosed |
| US-20040131963-A1 | Two-layer film and method of forming pattern with the same | JSR CORPORATION (JP) | 2004-07-08 | — | — | US | disclosed |
| US-5677102-A | DISSOLVING AN ALKALI SOLUBLE RESIN AND A QUINONEDIAZIDE GROUP CONTAINING COMPOUND; HEATING | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-10-14 | — | — | US | disclosed |
| US-5604077-A | MIXTURE OF ALKALI-SOLUBLE NOVOLAK AND A QUINONE DIAZIDE PHOTOSENSITIZER; HEAT RESISTANCE, RESOLUTION, ANTIFOULING AGENTS | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-02-18 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180134834-A1 | PHENOLIC-HYDROXYL-GROUP-CONTAINING NOVOLAC RESIN AND RESIST FILM | HACL2, ASH2L, HEATR1 | PTPN5 4736/4885PTPN2 4301/4885ELANE 4303/4885 |
| US-20170066703-A1 | COMPOUND CONTAINING MODIFIED PHENOLIC HYDROXY GROUP, METHOD FOR PRODUCING COMPOUND CONTAINING MODIFIED PHENOLIC HYDROXY GROUP, PHOTOSENSITIVE COMPOSITION, RESIST MATERIAL, AND RESIST COATING FILM | PAH, TYR, HACL2 | PTPN5 2894/4885PTPN2 2904/4885ELANE 4000/4885 |
| US-10577449-B2 | Phenolic-hydroxyl-group-containing novolac resin and resist film | HACL2, ASH2L, HEATR1 | PTPN5 4736/4885PTPN2 4301/4885ELANE 4303/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.